A role of dislocation-induced coalescence in the formation of a cluster structure in deposited films

In this manuscript we explored the evolution of a cluster structure in the deposited copper layers in the temperature range of 50K to 500K using the method of molecular dynamics. It has been shown that at a high degree of surface occupancy, the processes of atomic ordering have a nondiffusing charac...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Surface science 2011-07, Vol.605 (13-14), p.1157-1164
Hauptverfasser:	Marchenko, I.G., Marchenko, I.I.
Format:	Artikel
Sprache:	eng
Schlagworte:	Clusters Coalescence Coalescing Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Copper Cross-disciplinary physics: materials science rheology Deposition Diffusion and migration Dislocations Exact sciences and technology Molecular dynamics Molecular structure Order disorder Physics Surface structure
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!