Long-period fiber grating fabrication by high-intensity femtosecond pulses at 211 nm
Using high-intensity (110-200 GW/cm/sup 2/) 250-fs 211-nm laser pulses and a point-by-point technique, the efficiency of long-period grating inscription in H/sub 2/-loaded standard telecom Corning SMF-28 and H/sub 2/-free photosensitive B-codoped Fibercore fibers was studied and compared with those...
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| Veröffentlicht in: | Journal of lightwave technology 2005-08, Vol.23 (8), p.2568-2578 |
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| container_issue | 8 |
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| container_title | Journal of lightwave technology |
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| creator | Kalachev, A.I. Nikogosyan, D.N. Brambilla, G. |
| description | Using high-intensity (110-200 GW/cm/sup 2/) 250-fs 211-nm laser pulses and a point-by-point technique, the efficiency of long-period grating inscription in H/sub 2/-loaded standard telecom Corning SMF-28 and H/sub 2/-free photosensitive B-codoped Fibercore fibers was studied and compared with those at other existing recording methods (low-intensity 157-nm, 193-nm, 248-nm or high-intensity 264-nm fabrications). It was shown that at high-intensity 211-nm laser inscription, two-quantum photoreactions are responsible for long-period fiber grating (LPFG) formation, which results in a significant photosensitivity enhancement in comparison with conventional low-intensity 248-nm exposure (by 45 times for SMF-28 fiber). It was found that the grating strength in the case of SMF-28 fiber, irradiated with high-intensity 211-nm pulses, reaches 28 dB, which is the highest value among all known photochemical approaches. The thermal studies of the recorded gratings were also conducted. |
| doi_str_mv | 10.1109/JLT.2005.851335 |
| format | Article |
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It was shown that at high-intensity 211-nm laser inscription, two-quantum photoreactions are responsible for long-period fiber grating (LPFG) formation, which results in a significant photosensitivity enhancement in comparison with conventional low-intensity 248-nm exposure (by 45 times for SMF-28 fiber). It was found that the grating strength in the case of SMF-28 fiber, irradiated with high-intensity 211-nm pulses, reaches 28 dB, which is the highest value among all known photochemical approaches. The thermal studies of the recorded gratings were also conducted.</description><identifier>ISSN: 0733-8724</identifier><identifier>EISSN: 1558-2213</identifier><identifier>DOI: 10.1109/JLT.2005.851335</identifier><identifier>CODEN: JLTEDG</identifier><language>eng</language><publisher>New York, NY: IEEE</publisher><subject>Applied sciences ; Circuit properties ; Electric, optical and optoelectronic circuits ; Electromagnetic wave absorption ; Electronics ; Exact sciences and technology ; Fiber gratings ; Fiber lasers ; Fibers ; Integrated optics. Optical fibers and wave guides ; Laser excitation ; Lasers ; Microelectronic fabrication (materials and surfaces technology) ; Noise levels ; Optical and optoelectronic circuits ; Optical device fabrication ; Optical fiber devices ; optical fiber filters ; Optical fibers ; Optical pulses ; Optical refraction ; Photochemical ; Photochemistry ; Photosensitivity ; Recording ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Telecommunications ; Ultrafast optics ; ultraviolet radiation effects</subject><ispartof>Journal of lightwave technology, 2005-08, Vol.23 (8), p.2568-2578</ispartof><rights>2005 INIST-CNRS</rights><rights>Copyright The Institute of Electrical and Electronics Engineers, Inc. (IEEE) 2005</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c415t-6b815ebf11f378e634d37c7da6dfa2089f4940b36035f79cf85f1ed4b18f1b083</citedby><cites>FETCH-LOGICAL-c415t-6b815ebf11f378e634d37c7da6dfa2089f4940b36035f79cf85f1ed4b18f1b083</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://ieeexplore.ieee.org/document/1498962$$EHTML$$P50$$Gieee$$H</linktohtml><link.rule.ids>314,776,780,792,27901,27902,54733</link.rule.ids><linktorsrc>$$Uhttps://ieeexplore.ieee.org/document/1498962$$EView_record_in_IEEE$$FView_record_in_$$GIEEE</linktorsrc><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17055493$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Kalachev, A.I.</creatorcontrib><creatorcontrib>Nikogosyan, D.N.</creatorcontrib><creatorcontrib>Brambilla, G.</creatorcontrib><title>Long-period fiber grating fabrication by high-intensity femtosecond pulses at 211 nm</title><title>Journal of lightwave technology</title><addtitle>JLT</addtitle><description>Using high-intensity (110-200 GW/cm/sup 2/) 250-fs 211-nm laser pulses and a point-by-point technique, the efficiency of long-period grating inscription in H/sub 2/-loaded standard telecom Corning SMF-28 and H/sub 2/-free photosensitive B-codoped Fibercore fibers was studied and compared with those at other existing recording methods (low-intensity 157-nm, 193-nm, 248-nm or high-intensity 264-nm fabrications). It was shown that at high-intensity 211-nm laser inscription, two-quantum photoreactions are responsible for long-period fiber grating (LPFG) formation, which results in a significant photosensitivity enhancement in comparison with conventional low-intensity 248-nm exposure (by 45 times for SMF-28 fiber). It was found that the grating strength in the case of SMF-28 fiber, irradiated with high-intensity 211-nm pulses, reaches 28 dB, which is the highest value among all known photochemical approaches. The thermal studies of the recorded gratings were also conducted.</description><subject>Applied sciences</subject><subject>Circuit properties</subject><subject>Electric, optical and optoelectronic circuits</subject><subject>Electromagnetic wave absorption</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Fiber gratings</subject><subject>Fiber lasers</subject><subject>Fibers</subject><subject>Integrated optics. Optical fibers and wave guides</subject><subject>Laser excitation</subject><subject>Lasers</subject><subject>Microelectronic fabrication (materials and surfaces technology)</subject><subject>Noise levels</subject><subject>Optical and optoelectronic circuits</subject><subject>Optical device fabrication</subject><subject>Optical fiber devices</subject><subject>optical fiber filters</subject><subject>Optical fibers</subject><subject>Optical pulses</subject><subject>Optical refraction</subject><subject>Photochemical</subject><subject>Photochemistry</subject><subject>Photosensitivity</subject><subject>Recording</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Telecommunications</subject><subject>Ultrafast optics</subject><subject>ultraviolet radiation effects</subject><issn>0733-8724</issn><issn>1558-2213</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><sourceid>RIE</sourceid><recordid>eNqF0b1rGzEYBnARGoibZs6QRQRaupytV98ai-knhizOfOh0kqNgS450HvzfR8GGQId2kpB-7yPEg9AtkDkAMYs_q_WcEiLmWgBj4gLNQAjdUQrsA5oRxVinFeVX6GOtz4QA51rN0HqV06bb-xLziEMcfMGbYqeYNjjYoUTX9jnh4Yif4uapi2nyqcbpiIPfTbl6l9OI94dt9RXbCVMAnHaf0GWw7ejmvF6jxx_f18tf3erh5-_lt1XnOIipk4MG4YcAEJjSXjI-MuXUaOUYLCXaBG44GZgkTARlXNAigB_5ADrAQDS7Rl9OufuSXw6-Tv0uVue3W5t8PtSeasKkkrLBr_-EIBVQYUh76b-UUKqNMlQ1ev8Xfc6HktqPey0NUNCENrQ4IVdyrcWHfl_izpZjS-rfiutbcf1bcf2puDbx-Rxrq7PbUGxysb6PKSIEN6y5u5OL3vv3a260kZS9AtZvnvk</recordid><startdate>20050801</startdate><enddate>20050801</enddate><creator>Kalachev, A.I.</creator><creator>Nikogosyan, D.N.</creator><creator>Brambilla, G.</creator><general>IEEE</general><general>Institute of Electrical and Electronics Engineers</general><general>The Institute of Electrical and Electronics Engineers, Inc. (IEEE)</general><scope>97E</scope><scope>RIA</scope><scope>RIE</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>20050801</creationdate><title>Long-period fiber grating fabrication by high-intensity femtosecond pulses at 211 nm</title><author>Kalachev, A.I. ; Nikogosyan, D.N. ; Brambilla, G.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c415t-6b815ebf11f378e634d37c7da6dfa2089f4940b36035f79cf85f1ed4b18f1b083</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Applied sciences</topic><topic>Circuit properties</topic><topic>Electric, optical and optoelectronic circuits</topic><topic>Electromagnetic wave absorption</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Fiber gratings</topic><topic>Fiber lasers</topic><topic>Fibers</topic><topic>Integrated optics. Optical fibers and wave guides</topic><topic>Laser excitation</topic><topic>Lasers</topic><topic>Microelectronic fabrication (materials and surfaces technology)</topic><topic>Noise levels</topic><topic>Optical and optoelectronic circuits</topic><topic>Optical device fabrication</topic><topic>Optical fiber devices</topic><topic>optical fiber filters</topic><topic>Optical fibers</topic><topic>Optical pulses</topic><topic>Optical refraction</topic><topic>Photochemical</topic><topic>Photochemistry</topic><topic>Photosensitivity</topic><topic>Recording</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Telecommunications</topic><topic>Ultrafast optics</topic><topic>ultraviolet radiation effects</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kalachev, A.I.</creatorcontrib><creatorcontrib>Nikogosyan, D.N.</creatorcontrib><creatorcontrib>Brambilla, G.</creatorcontrib><collection>IEEE All-Society Periodicals Package (ASPP) 2005-present</collection><collection>IEEE All-Society Periodicals Package (ASPP) 1998-Present</collection><collection>IEEE Electronic Library (IEL)</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of lightwave technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kalachev, A.I.</au><au>Nikogosyan, D.N.</au><au>Brambilla, G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Long-period fiber grating fabrication by high-intensity femtosecond pulses at 211 nm</atitle><jtitle>Journal of lightwave technology</jtitle><stitle>JLT</stitle><date>2005-08-01</date><risdate>2005</risdate><volume>23</volume><issue>8</issue><spage>2568</spage><epage>2578</epage><pages>2568-2578</pages><issn>0733-8724</issn><eissn>1558-2213</eissn><coden>JLTEDG</coden><abstract>Using high-intensity (110-200 GW/cm/sup 2/) 250-fs 211-nm laser pulses and a point-by-point technique, the efficiency of long-period grating inscription in H/sub 2/-loaded standard telecom Corning SMF-28 and H/sub 2/-free photosensitive B-codoped Fibercore fibers was studied and compared with those at other existing recording methods (low-intensity 157-nm, 193-nm, 248-nm or high-intensity 264-nm fabrications). It was shown that at high-intensity 211-nm laser inscription, two-quantum photoreactions are responsible for long-period fiber grating (LPFG) formation, which results in a significant photosensitivity enhancement in comparison with conventional low-intensity 248-nm exposure (by 45 times for SMF-28 fiber). It was found that the grating strength in the case of SMF-28 fiber, irradiated with high-intensity 211-nm pulses, reaches 28 dB, which is the highest value among all known photochemical approaches. The thermal studies of the recorded gratings were also conducted.</abstract><cop>New York, NY</cop><pub>IEEE</pub><doi>10.1109/JLT.2005.851335</doi><tpages>11</tpages></addata></record> |
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| subjects | Applied sciences Circuit properties Electric, optical and optoelectronic circuits Electromagnetic wave absorption Electronics Exact sciences and technology Fiber gratings Fiber lasers Fibers Integrated optics. Optical fibers and wave guides Laser excitation Lasers Microelectronic fabrication (materials and surfaces technology) Noise levels Optical and optoelectronic circuits Optical device fabrication Optical fiber devices optical fiber filters Optical fibers Optical pulses Optical refraction Photochemical Photochemistry Photosensitivity Recording Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Telecommunications Ultrafast optics ultraviolet radiation effects |
| title | Long-period fiber grating fabrication by high-intensity femtosecond pulses at 211 nm |
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