Annealing and recrystallization of amorphous ZnO thin films deposited under cryogenic conditions by pulsed laser deposition

This article deals with the annealing of amorphous ZnO thin films prepared by pulsed laser deposition (PLD) under cryogenic conditions. The substrate holder was cooled by liquid nitrogen. X-ray diffraction analysis evidenced that as-deposited films had amorphous structures: analysis by scanning elec...

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Veröffentlicht in:	Thin solid films 2011-11, Vol.520 (2), p.866-870
Hauptverfasser:	Bruncko, J., Vincze, A., Netrvalova, M., Šutta, P., Hasko, D., Michalka, M.
Format:	Artikel
Sprache:	eng
Schlagworte:	Amorphous structure Annealing Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Cryogenic temperature Diffraction Electron, ion, and scanning probe microscopy Exact sciences and technology Laser deposition Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Pulsed laser deposition Recrystallization Scanning electron microscopy Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Thin films X-rays Zinc oxide
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