Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group
Novel lophine dimer (hexaarylbiimidazole, HABI) containing a hydrophilic oligo-ethylene glycol group was prepared as a radical initiator. Absorption of a lophyl radical generated by photo dissociation of the lophine dimer was observed around 600nm by photo irradiation at 254nm. Electron beam (EB) pu...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2007, Vol.20(5), pp.757-762 |
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| container_issue | 5 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 20 |
| creator | Igarashi, Hiroyuki Igarashi, Tsutomu Sagawa, Minoru Mori, Toru Kotani, Yuzo Muroya, Yusa Katsumura, Yosuke Yamashita, Takashi |
| description | Novel lophine dimer (hexaarylbiimidazole, HABI) containing a hydrophilic oligo-ethylene glycol group was prepared as a radical initiator. Absorption of a lophyl radical generated by photo dissociation of the lophine dimer was observed around 600nm by photo irradiation at 254nm. Electron beam (EB) pulse radiolysis of the lophine dimer suggested generation of lophyl radical by EB irradiation similarly, showing that the material is also applicable to electron beam lithography. The lophine dimmer showed excellent stability in developing solution and high resolution due to introduction of hydrophilic substituent. |
| doi_str_mv | 10.2494/photopolymer.20.757 |
| format | Article |
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The lophine dimmer showed excellent stability in developing solution and high resolution due to introduction of hydrophilic substituent.</description><subject>Dimers</subject><subject>dispersion stability</subject><subject>Electron beam lithography</subject><subject>hydrophobic group</subject><subject>Initiators</subject><subject>Irradiation</subject><subject>lophine dimmer</subject><subject>lophyl radical</subject><subject>Photopolymers</subject><subject>Radicals</subject><subject>Radiolysis</subject><subject>Stability</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2007</creationdate><recordtype>article</recordtype><recordid>eNplkE1LKzEUhoMoWD9-gZuAm7uZmu-ZLKX3aoWiLhSXIWbO2JRpMiap0H_vlIpcdHPO4jzPOYcXoQtKpkxocTUsY4lD7LdrSFNGprWsD9CEcqErxbk6RBOiqag0E-IYneS8IoRzKfUEvTwmGGyyxceAbWjx425VAuuK__Bli2OHLb6PH9DjRRyWPgD-68czeBZDsT748DYC822bdtPeO3yb4mY4Q0ed7TOcf_VT9Hzz72k2rxYPt3ez60XlpGpK1dpWcyo7omoLTopOKV7LVwVcgZKiaToGzNWatUy-akU6TcE5JTuuZdMQ4Kfoz37vkOL7BnIxa58d9L0NEDfZUFVTJhRjzYhe_kBXcZPC-J2hQgglmBL1SPE95VLMOUFnhuTXNm0NJWYXtvk_bMOIGcMerfneWuVi3-Dbsal418MvR-7LqH4jbmmTgcA_AW0QkWk</recordid><startdate>20070101</startdate><enddate>20070101</enddate><creator>Igarashi, Hiroyuki</creator><creator>Igarashi, Tsutomu</creator><creator>Sagawa, Minoru</creator><creator>Mori, Toru</creator><creator>Kotani, Yuzo</creator><creator>Muroya, Yusa</creator><creator>Katsumura, Yosuke</creator><creator>Yamashita, Takashi</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20070101</creationdate><title>Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group</title><author>Igarashi, Hiroyuki ; Igarashi, Tsutomu ; Sagawa, Minoru ; Mori, Toru ; Kotani, Yuzo ; Muroya, Yusa ; Katsumura, Yosuke ; Yamashita, Takashi</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c568t-dad9315f067aec54f66375b6e36e65488f2e2c792d25b960f91ecc65f395880e3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2007</creationdate><topic>Dimers</topic><topic>dispersion stability</topic><topic>Electron beam lithography</topic><topic>hydrophobic group</topic><topic>Initiators</topic><topic>Irradiation</topic><topic>lophine dimmer</topic><topic>lophyl radical</topic><topic>Photopolymers</topic><topic>Radicals</topic><topic>Radiolysis</topic><topic>Stability</topic><toplevel>online_resources</toplevel><creatorcontrib>Igarashi, Hiroyuki</creatorcontrib><creatorcontrib>Igarashi, Tsutomu</creatorcontrib><creatorcontrib>Sagawa, Minoru</creatorcontrib><creatorcontrib>Mori, Toru</creatorcontrib><creatorcontrib>Kotani, Yuzo</creatorcontrib><creatorcontrib>Muroya, Yusa</creatorcontrib><creatorcontrib>Katsumura, Yosuke</creatorcontrib><creatorcontrib>Yamashita, Takashi</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Igarashi, Hiroyuki</au><au>Igarashi, Tsutomu</au><au>Sagawa, Minoru</au><au>Mori, Toru</au><au>Kotani, Yuzo</au><au>Muroya, Yusa</au><au>Katsumura, Yosuke</au><au>Yamashita, Takashi</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2007-01-01</date><risdate>2007</risdate><volume>20</volume><issue>5</issue><spage>757</spage><epage>762</epage><pages>757-762</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>Novel lophine dimer (hexaarylbiimidazole, HABI) containing a hydrophilic oligo-ethylene glycol group was prepared as a radical initiator. Absorption of a lophyl radical generated by photo dissociation of the lophine dimer was observed around 600nm by photo irradiation at 254nm. Electron beam (EB) pulse radiolysis of the lophine dimer suggested generation of lophyl radical by EB irradiation similarly, showing that the material is also applicable to electron beam lithography. The lophine dimmer showed excellent stability in developing solution and high resolution due to introduction of hydrophilic substituent.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.20.757</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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| subjects | Dimers dispersion stability Electron beam lithography hydrophobic group Initiators Irradiation lophine dimmer lophyl radical Photopolymers Radicals Radiolysis Stability |
| title | Preparation and Photoreactivity of a Novel Lophine Dimer Containing a Hydrophilic Group |
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