Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres
Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluate...
Gespeichert in:
| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2006, Vol.19(2), pp.241-244 |
|---|---|
| Hauptverfasser: | , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 244 |
|---|---|
| container_issue | 2 |
| container_start_page | 241 |
| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 19 |
| creator | Shoji, Atsumu Fukushima, Taketoshi Kumar, D. Sadthi Kashiwagi, Kunihiro Yoshida, Yasuhiko |
| description | Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property. |
| doi_str_mv | 10.2494/photopolymer.19.241 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1671223960</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1671223960</sourcerecordid><originalsourceid>FETCH-LOGICAL-c568t-7c5dd89fdf31dd261a165debb0e263f508c666eb9e954e0ebd9516c0c3bf1f703</originalsourceid><addsrcrecordid>eNplkMFu1DAQhi0EUpfCE_RiiQuXFE_seNfHqtAWqYhVW86WY49Zr5I42M6hfXpcBVUILjPSP983Gg0hZ8DOW6HEp_kQS5zj8DhiOgdVQ3hFNsCFaiTn8jXZMAWiUa0QJ-RtzkfGOO86tSHufkneWKTfogs-WFNCnGj0dD-YPBq6X5eGJ3T0PgzB1ukd5jDRqzCMme5TdIutQ1Po5-A9JpwKvTaZXpQx5vlQg_yOvPFmyPj-Tz8lP66-PFzeNLffr79eXtw2tpO70mxt59xOeec5ONdKMCA7h33PsJXcd2xnpZTYK1SdQIa9Ux1IyyzvPfgt46fk47p3TvHXgrnoMWSLw2AmjEvWILfQtlzJZ_TDP-gxLmmq12kQQki-BaYqxVfKpphzQq_nFEaTHjUw_fx5_ffnNagaQrVuVuuYi_mJL45JJdgB_3fWUtUXxB5M0jjx35LDlwg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1444637109</pqid></control><display><type>article</type><title>Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres</title><source>J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese</source><source>Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals</source><source>Free Full-Text Journals in Chemistry</source><creator>Shoji, Atsumu ; Fukushima, Taketoshi ; Kumar, D. Sadthi ; Kashiwagi, Kunihiro ; Yoshida, Yasuhiko</creator><creatorcontrib>Shoji, Atsumu ; Fukushima, Taketoshi ; Kumar, D. Sadthi ; Kashiwagi, Kunihiro ; Yoshida, Yasuhiko</creatorcontrib><description>Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property.</description><identifier>ISSN: 0914-9244</identifier><identifier>ISSN: 1349-6336</identifier><identifier>EISSN: 1349-6336</identifier><identifier>DOI: 10.2494/photopolymer.19.241</identifier><language>eng</language><publisher>Hiratsuka: The Society of Photopolymer Science and Technology(SPST)</publisher><subject>Ambience ; antifogging ; Carbon ; hydrophilic ; hydrophobic ; Hydrophobicity ; plasma ; Polymerization ; Polymers ; silicon resin ; Silicone resins ; Thin films ; Water drops</subject><ispartof>Journal of Photopolymer Science and Technology, 2006, Vol.19(2), pp.241-244</ispartof><rights>2006 The Society of Photopolymer Science and Technology (SPST)</rights><rights>Copyright Japan Science and Technology Agency 2006</rights><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c568t-7c5dd89fdf31dd261a165debb0e263f508c666eb9e954e0ebd9516c0c3bf1f703</citedby><cites>FETCH-LOGICAL-c568t-7c5dd89fdf31dd261a165debb0e263f508c666eb9e954e0ebd9516c0c3bf1f703</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,1877,27901,27902</link.rule.ids></links><search><creatorcontrib>Shoji, Atsumu</creatorcontrib><creatorcontrib>Fukushima, Taketoshi</creatorcontrib><creatorcontrib>Kumar, D. Sadthi</creatorcontrib><creatorcontrib>Kashiwagi, Kunihiro</creatorcontrib><creatorcontrib>Yoshida, Yasuhiko</creatorcontrib><title>Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres</title><title>Journal of Photopolymer Science and Technology</title><addtitle>J. Photopol. Sci. Technol.</addtitle><description>Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property.</description><subject>Ambience</subject><subject>antifogging</subject><subject>Carbon</subject><subject>hydrophilic</subject><subject>hydrophobic</subject><subject>Hydrophobicity</subject><subject>plasma</subject><subject>Polymerization</subject><subject>Polymers</subject><subject>silicon resin</subject><subject>Silicone resins</subject><subject>Thin films</subject><subject>Water drops</subject><issn>0914-9244</issn><issn>1349-6336</issn><issn>1349-6336</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNplkMFu1DAQhi0EUpfCE_RiiQuXFE_seNfHqtAWqYhVW86WY49Zr5I42M6hfXpcBVUILjPSP983Gg0hZ8DOW6HEp_kQS5zj8DhiOgdVQ3hFNsCFaiTn8jXZMAWiUa0QJ-RtzkfGOO86tSHufkneWKTfogs-WFNCnGj0dD-YPBq6X5eGJ3T0PgzB1ukd5jDRqzCMme5TdIutQ1Po5-A9JpwKvTaZXpQx5vlQg_yOvPFmyPj-Tz8lP66-PFzeNLffr79eXtw2tpO70mxt59xOeec5ONdKMCA7h33PsJXcd2xnpZTYK1SdQIa9Ux1IyyzvPfgt46fk47p3TvHXgrnoMWSLw2AmjEvWILfQtlzJZ_TDP-gxLmmq12kQQki-BaYqxVfKpphzQq_nFEaTHjUw_fx5_ffnNagaQrVuVuuYi_mJL45JJdgB_3fWUtUXxB5M0jjx35LDlwg</recordid><startdate>20060101</startdate><enddate>20060101</enddate><creator>Shoji, Atsumu</creator><creator>Fukushima, Taketoshi</creator><creator>Kumar, D. Sadthi</creator><creator>Kashiwagi, Kunihiro</creator><creator>Yoshida, Yasuhiko</creator><general>The Society of Photopolymer Science and Technology(SPST)</general><general>Japan Science and Technology Agency</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20060101</creationdate><title>Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres</title><author>Shoji, Atsumu ; Fukushima, Taketoshi ; Kumar, D. Sadthi ; Kashiwagi, Kunihiro ; Yoshida, Yasuhiko</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c568t-7c5dd89fdf31dd261a165debb0e263f508c666eb9e954e0ebd9516c0c3bf1f703</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Ambience</topic><topic>antifogging</topic><topic>Carbon</topic><topic>hydrophilic</topic><topic>hydrophobic</topic><topic>Hydrophobicity</topic><topic>plasma</topic><topic>Polymerization</topic><topic>Polymers</topic><topic>silicon resin</topic><topic>Silicone resins</topic><topic>Thin films</topic><topic>Water drops</topic><toplevel>online_resources</toplevel><creatorcontrib>Shoji, Atsumu</creatorcontrib><creatorcontrib>Fukushima, Taketoshi</creatorcontrib><creatorcontrib>Kumar, D. Sadthi</creatorcontrib><creatorcontrib>Kashiwagi, Kunihiro</creatorcontrib><creatorcontrib>Yoshida, Yasuhiko</creatorcontrib><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of Photopolymer Science and Technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Shoji, Atsumu</au><au>Fukushima, Taketoshi</au><au>Kumar, D. Sadthi</au><au>Kashiwagi, Kunihiro</au><au>Yoshida, Yasuhiko</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres</atitle><jtitle>Journal of Photopolymer Science and Technology</jtitle><addtitle>J. Photopol. Sci. Technol.</addtitle><date>2006-01-01</date><risdate>2006</risdate><volume>19</volume><issue>2</issue><spage>241</spage><epage>244</epage><pages>241-244</pages><issn>0914-9244</issn><issn>1349-6336</issn><eissn>1349-6336</eissn><abstract>Plasma polymerized silicone resin thin films were produced at different ambience by introducing different gases. Hydrophilicity and hydrophobicity of the plasma polymerized films were measured by the contact angle made by the water drops to the films surface. Films antifogging property also evaluated during our work. By introducing O2 gas and HCOOH vapor, we found that the plasma polymer films were showing high hydrophilic and antifogging nature. The films produced in the ambience of CF4 gas and the carbon fluoride gases found to be high hydrophobic in nature but were not showed any antifogging property.</abstract><cop>Hiratsuka</cop><pub>The Society of Photopolymer Science and Technology(SPST)</pub><doi>10.2494/photopolymer.19.241</doi><tpages>4</tpages><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0914-9244 |
| ispartof | Journal of Photopolymer Science and Technology, 2006, Vol.19(2), pp.241-244 |
| issn | 0914-9244 1349-6336 1349-6336 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_1671223960 |
| source | J-STAGE (Japan Science & Technology Information Aggregator, Electronic) Freely Available Titles - Japanese; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Free Full-Text Journals in Chemistry |
| subjects | Ambience antifogging Carbon hydrophilic hydrophobic Hydrophobicity plasma Polymerization Polymers silicon resin Silicone resins Thin films Water drops |
| title | Surface Modification of Plasma Polymerized Silicon Resin Films Produced at Different Gas Atmospheres |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T02%3A46%3A41IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Surface%20Modification%20of%20Plasma%20Polymerized%20Silicon%20Resin%20Films%20Produced%20at%20Different%20Gas%20Atmospheres&rft.jtitle=Journal%20of%20Photopolymer%20Science%20and%20Technology&rft.au=Shoji,%20Atsumu&rft.date=2006-01-01&rft.volume=19&rft.issue=2&rft.spage=241&rft.epage=244&rft.pages=241-244&rft.issn=0914-9244&rft.eissn=1349-6336&rft_id=info:doi/10.2494/photopolymer.19.241&rft_dat=%3Cproquest_cross%3E1671223960%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1444637109&rft_id=info:pmid/&rfr_iscdi=true |