Thin film deposition with time-varying temperature

We study the effects of time-dependent substrate/film temperature in the deposition of a mesoscopically thick film using a statistical model that accounts for diffusion of adatoms without lateral neighbors whose coefficients depend on an activation energy and temperature. Dynamic scaling with fixed...

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Veröffentlicht in:	Journal of statistical mechanics 2013-10, Vol.2013 (10), p.P10008-19
Hauptverfasser:	de Assis, T A, Aarão Reis, F D A
Format:	Artikel
Sprache:	eng
Schlagworte:	Activation energy Computer simulation Deposition Exponents Mathematical models Roughness Statistical analysis Thick films Thin films
Online-Zugang:	Volltext
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