Effects of Annealing Temperature on the Properties of Copper Films Prepared by Magnetron Sputtering

Copper oxide thin films were prepared by a direct-current magnetron sputtering method followed by a thermal annealing treatment at 100-500 ℃. The obtained films were characterized by X-ray diffraction, UV-vis absorption spectroscopy, scanning electron microscopy, Raman spectroscopy, and X-ray photoe...

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Veröffentlicht in:	Journal of Wuhan University of Technology. Materials science edition 2015-02, Vol.30 (1), p.92-96
Hauptverfasser:	Liu, Yiming, Zhang, Jianjun, Zhang, Wanggang, Liang, Wei, Yu, Bin, Xue, Jinbo
Format:	Artikel
Sprache:	eng
Schlagworte:	Advanced Materials Annealing ANNEALING PROCESSES ANNEALING TEMPERATURE Chemistry and Materials Science Copper COPPER OXIDE Copper oxides CUPROUS OXIDE Diffraction Magnetron sputtering Materials Science OXIDES Photocatalysis SPUTTERING THIN FILMS X RAYS X射线光电子能谱性能扫描电子显微镜氧化亚铜薄膜热退火处理直流磁控溅射法紫外可见吸收光谱退火温度
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