Polymer–Fullerene Bulk Heterojunction-Based Strain-Sensitive Flexible Organic Field-Effect Transistor
In this work, we have fabricated organic field-effect transistor using the blend of poly(3-hexylthiophene) and [6,6]-phenyl C61-butyric acid methylester as active layer. Transistor was fabricated in MESFET-type configuration with top gate and bottom drain/source contacts on flexible PET substrate. D...
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Veröffentlicht in: | Arabian Journal for Science and Engineering 2015-01, Vol.40 (1), p.257-262 |
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creator | Yasin, Muhammad Tauqeer, T. Rahman, Hamood Ur Karimov, Kh. S. San, Sait E. Tunc, Ali V. |
description | In this work, we have fabricated organic field-effect transistor using the blend of poly(3-hexylthiophene) and [6,6]-phenyl C61-butyric acid methylester as active layer. Transistor was fabricated in MESFET-type configuration with top gate and bottom drain/source contacts on flexible PET substrate. Drain and source contacts were made using silver (Ag), whereas gate contact was made by depositing aluminium (Al) on the active layer. Active layer showed ohmic-type contact with drain/source electrodes and Schottky-type contact with gate electrode, which was discussed with the help of energy band diagram. Current–Voltage (
I
–
V
) characteristics of the transistor were found similar to p-type mode
I
–
V
characteristics of a typical low-voltage ambipolar field-effect transistor. Strain sensing properties of the device were investigated by bending it at 0° and 90° with respect to the direction of drain-to-source current for different strains of 1, 1.6, and 3.2 %. Significant proportional variation in the drain-to-source current was observed due to the bending from both sides; however, sensitivity of the device was found higher when strain was applied at 90° with respect to drain-to-source current. Sensitivity values were found to be equal to 0.18 and 0.65 μA/ % when a constant bending strain of 3.2 % was applied at 0° and 90° with respect to the direction of drain-to-source current, respectively. |
doi_str_mv | 10.1007/s13369-014-1508-6 |
format | Article |
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I
–
V
) characteristics of the transistor were found similar to p-type mode
I
–
V
characteristics of a typical low-voltage ambipolar field-effect transistor. Strain sensing properties of the device were investigated by bending it at 0° and 90° with respect to the direction of drain-to-source current for different strains of 1, 1.6, and 3.2 %. Significant proportional variation in the drain-to-source current was observed due to the bending from both sides; however, sensitivity of the device was found higher when strain was applied at 90° with respect to drain-to-source current. Sensitivity values were found to be equal to 0.18 and 0.65 μA/ % when a constant bending strain of 3.2 % was applied at 0° and 90° with respect to the direction of drain-to-source current, respectively.</description><identifier>ISSN: 1319-8025</identifier><identifier>EISSN: 2191-4281</identifier><identifier>DOI: 10.1007/s13369-014-1508-6</identifier><language>eng</language><publisher>Berlin/Heidelberg: Springer Berlin Heidelberg</publisher><subject>Aluminum ; Devices ; Drains ; Electrodes ; Engineering ; Field effect transistors ; Gates ; Humanities and Social Sciences ; multidisciplinary ; Research Article - Physics ; Science ; Semiconductor devices ; Silver ; Strain</subject><ispartof>Arabian Journal for Science and Engineering, 2015-01, Vol.40 (1), p.257-262</ispartof><rights>King Fahd University of Petroleum and Minerals 2014</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c321t-2c0025b768774b539f22cbed67625f1c69712879d29a7d28478d6f12292dc3043</citedby><cites>FETCH-LOGICAL-c321t-2c0025b768774b539f22cbed67625f1c69712879d29a7d28478d6f12292dc3043</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://link.springer.com/content/pdf/10.1007/s13369-014-1508-6$$EPDF$$P50$$Gspringer$$H</linktopdf><linktohtml>$$Uhttps://link.springer.com/10.1007/s13369-014-1508-6$$EHTML$$P50$$Gspringer$$H</linktohtml><link.rule.ids>314,776,780,27901,27902,41464,42533,51294</link.rule.ids></links><search><creatorcontrib>Yasin, Muhammad</creatorcontrib><creatorcontrib>Tauqeer, T.</creatorcontrib><creatorcontrib>Rahman, Hamood Ur</creatorcontrib><creatorcontrib>Karimov, Kh. S.</creatorcontrib><creatorcontrib>San, Sait E.</creatorcontrib><creatorcontrib>Tunc, Ali V.</creatorcontrib><title>Polymer–Fullerene Bulk Heterojunction-Based Strain-Sensitive Flexible Organic Field-Effect Transistor</title><title>Arabian Journal for Science and Engineering</title><addtitle>Arab J Sci Eng</addtitle><description>In this work, we have fabricated organic field-effect transistor using the blend of poly(3-hexylthiophene) and [6,6]-phenyl C61-butyric acid methylester as active layer. Transistor was fabricated in MESFET-type configuration with top gate and bottom drain/source contacts on flexible PET substrate. Drain and source contacts were made using silver (Ag), whereas gate contact was made by depositing aluminium (Al) on the active layer. Active layer showed ohmic-type contact with drain/source electrodes and Schottky-type contact with gate electrode, which was discussed with the help of energy band diagram. Current–Voltage (
I
–
V
) characteristics of the transistor were found similar to p-type mode
I
–
V
characteristics of a typical low-voltage ambipolar field-effect transistor. Strain sensing properties of the device were investigated by bending it at 0° and 90° with respect to the direction of drain-to-source current for different strains of 1, 1.6, and 3.2 %. Significant proportional variation in the drain-to-source current was observed due to the bending from both sides; however, sensitivity of the device was found higher when strain was applied at 90° with respect to drain-to-source current. Sensitivity values were found to be equal to 0.18 and 0.65 μA/ % when a constant bending strain of 3.2 % was applied at 0° and 90° with respect to the direction of drain-to-source current, respectively.</description><subject>Aluminum</subject><subject>Devices</subject><subject>Drains</subject><subject>Electrodes</subject><subject>Engineering</subject><subject>Field effect transistors</subject><subject>Gates</subject><subject>Humanities and Social Sciences</subject><subject>multidisciplinary</subject><subject>Research Article - Physics</subject><subject>Science</subject><subject>Semiconductor devices</subject><subject>Silver</subject><subject>Strain</subject><issn>1319-8025</issn><issn>2191-4281</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNp9kL1OwzAQgC0EEuXnAdgyshh8l8R2RlpRQEICqTBbqXOpXFwH7ATRjXfgDXkSgsrMdMv3ne4-xs5AXIAQ6jJBnsuKCyg4lEJzuccmCBXwAjXsswnkUHEtsDxkRymthZCgVT5hq8fObzcUvz-_5oP3FClQNh38S3ZLPcVuPQTbuy7waZ2oyRZ9rF3gCwrJ9e6dsrmnD7f0lD3EVR2czeaOfMOv25Zsnz3FegRT38UTdtDWPtHp3zxmz_Prp9ktv3-4uZtd3XObI_QcrRhvXCqplSqWZV61iHZJjVQSyxasrBSgVlWDVa0a1IXSjWwBscLG5qLIj9n5bu9r7N4GSr3ZuGTJ-zpQNyQDUgqhJWI5orBDbexSitSa1-g2ddwaEOY3qtlFNWNU8xvVyNHBnZNGNqwomnU3xDB-9I_0A72UeuQ</recordid><startdate>20150101</startdate><enddate>20150101</enddate><creator>Yasin, Muhammad</creator><creator>Tauqeer, T.</creator><creator>Rahman, Hamood Ur</creator><creator>Karimov, Kh. S.</creator><creator>San, Sait E.</creator><creator>Tunc, Ali V.</creator><general>Springer Berlin Heidelberg</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7QF</scope><scope>7SP</scope><scope>7SR</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>JG9</scope><scope>KR7</scope><scope>L7M</scope></search><sort><creationdate>20150101</creationdate><title>Polymer–Fullerene Bulk Heterojunction-Based Strain-Sensitive Flexible Organic Field-Effect Transistor</title><author>Yasin, Muhammad ; Tauqeer, T. ; Rahman, Hamood Ur ; Karimov, Kh. S. ; San, Sait E. ; Tunc, Ali V.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c321t-2c0025b768774b539f22cbed67625f1c69712879d29a7d28478d6f12292dc3043</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Aluminum</topic><topic>Devices</topic><topic>Drains</topic><topic>Electrodes</topic><topic>Engineering</topic><topic>Field effect transistors</topic><topic>Gates</topic><topic>Humanities and Social Sciences</topic><topic>multidisciplinary</topic><topic>Research Article - Physics</topic><topic>Science</topic><topic>Semiconductor devices</topic><topic>Silver</topic><topic>Strain</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Yasin, Muhammad</creatorcontrib><creatorcontrib>Tauqeer, T.</creatorcontrib><creatorcontrib>Rahman, Hamood Ur</creatorcontrib><creatorcontrib>Karimov, Kh. S.</creatorcontrib><creatorcontrib>San, Sait E.</creatorcontrib><creatorcontrib>Tunc, Ali V.</creatorcontrib><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><collection>Civil Engineering Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Arabian Journal for Science and Engineering</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Yasin, Muhammad</au><au>Tauqeer, T.</au><au>Rahman, Hamood Ur</au><au>Karimov, Kh. S.</au><au>San, Sait E.</au><au>Tunc, Ali V.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Polymer–Fullerene Bulk Heterojunction-Based Strain-Sensitive Flexible Organic Field-Effect Transistor</atitle><jtitle>Arabian Journal for Science and Engineering</jtitle><stitle>Arab J Sci Eng</stitle><date>2015-01-01</date><risdate>2015</risdate><volume>40</volume><issue>1</issue><spage>257</spage><epage>262</epage><pages>257-262</pages><issn>1319-8025</issn><eissn>2191-4281</eissn><abstract>In this work, we have fabricated organic field-effect transistor using the blend of poly(3-hexylthiophene) and [6,6]-phenyl C61-butyric acid methylester as active layer. Transistor was fabricated in MESFET-type configuration with top gate and bottom drain/source contacts on flexible PET substrate. Drain and source contacts were made using silver (Ag), whereas gate contact was made by depositing aluminium (Al) on the active layer. Active layer showed ohmic-type contact with drain/source electrodes and Schottky-type contact with gate electrode, which was discussed with the help of energy band diagram. Current–Voltage (
I
–
V
) characteristics of the transistor were found similar to p-type mode
I
–
V
characteristics of a typical low-voltage ambipolar field-effect transistor. Strain sensing properties of the device were investigated by bending it at 0° and 90° with respect to the direction of drain-to-source current for different strains of 1, 1.6, and 3.2 %. Significant proportional variation in the drain-to-source current was observed due to the bending from both sides; however, sensitivity of the device was found higher when strain was applied at 90° with respect to drain-to-source current. Sensitivity values were found to be equal to 0.18 and 0.65 μA/ % when a constant bending strain of 3.2 % was applied at 0° and 90° with respect to the direction of drain-to-source current, respectively.</abstract><cop>Berlin/Heidelberg</cop><pub>Springer Berlin Heidelberg</pub><doi>10.1007/s13369-014-1508-6</doi><tpages>6</tpages></addata></record> |
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subjects | Aluminum Devices Drains Electrodes Engineering Field effect transistors Gates Humanities and Social Sciences multidisciplinary Research Article - Physics Science Semiconductor devices Silver Strain |
title | Polymer–Fullerene Bulk Heterojunction-Based Strain-Sensitive Flexible Organic Field-Effect Transistor |
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