Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistance

The non-stoichiometric NiO films are deposited on glass substrates at ambient temperature through radio frequency (rf) sputtering of NiO target with oxygen ion source by ion gun at varying ion beam current. An ultra high electrical resistivity is achieved that cannot be detected by four-point probe...

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Veröffentlicht in:	Thin solid films 2014-12, Vol.572, p.51-55
Hauptverfasser:	Chen, S.C., Wen, C.K., Kuo, T.Y., Peng, W.C., Lin, H.C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Ambient temperature Deposition Discharge Electrical resistivity Ion beams Ion sources NiO films Optoelectronic properties Oxygen ion source assistance p-type conduction Sputtering Thin films Transmittance
Online-Zugang:	Volltext
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