Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study

Atomic structure, electronic structure and properties of ZrBCN materials were studied using ab-initio calculations. We focus on the effect of N and Zr content and compare our results with the characteristics of samples prepared by reactive magnetron sputtering. We find that the materials are charact...

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Veröffentlicht in:Thin solid films 2013-09, Vol.542, p.225-231
Hauptverfasser: Houska, J., Kohout, J., Vlcek, J.
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description Atomic structure, electronic structure and properties of ZrBCN materials were studied using ab-initio calculations. We focus on the effect of N and Zr content and compare our results with the characteristics of samples prepared by reactive magnetron sputtering. We find that the materials are characterized by a mixture of covalent and metallic bonding. The metallic-to-covalent ratio is primarily controlled by the N content, and well correlated with measured electrical resistivity. ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system. Hard nanostructure forms at high Zr and low N content, containing (i) pure ZrN and (ii) (theoretically predicted and experimentally observed) solid solution close to ZrB0.50N0.50. The results allow one to tailor ZrBCN compositions which can combine different functional properties, such as high thermal stability, high hardness and electrical conductivity. •Resistivity of ZrBCN films of various compositions spans from 10−6 to >107Ωm.•Calculations show a mixture of metallic and covalent bonding controlled by [N].•ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system.•Calculations explain the presence of two crystalline phases at high [Zr] and low [N].•Results allow to tailor ZrBCN compositions combining different functional properties.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1660035438</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S004060901301184X</els_id><sourcerecordid>1660035438</sourcerecordid><originalsourceid>FETCH-LOGICAL-c360t-2e728a692b86843a205625fef82f9c0b61a5c5a42ba8649dc4ae4b7d436097693</originalsourceid><addsrcrecordid>eNp9kM1KxDAURoMoOI4-gLtsBBe23qRt2upKB_9AdKMbNyFNbyBDJx2TVPDtzTiiO1eBm_N9uTmEHDPIGTBxvsxjMDkHVuRQ58Bgh8xYU7cZrwu2S2YAJWQCWtgnByEsAYBxXsxIuDEGdaSjoU9UuZ6-eapHF9GlmaMh-knHyeMZxSFxfnRW_02_E2s_rtFHi2HT8uavF090pSJ6q4ZwQa8cVV1mnY12TMmp_zwkeyZd4dHPOSevtzcvi_vs8fnuYXH1mOlCQMw41rxRouVdI5qyUBwqwSuDpuGm1dAJpipdqZJ3qhFl2-tSYdnVfZnSbS3aYk5Ot71pw_cJQ5QrGzQOg3I4TkEyIQCKqiyahLItqv0Ygkcj196ulP-UDORGsFzKJFhuBEuoZRKcMic_9SpoNRivnLbhN8hrUbUVE4m73HKY_vph0cugLTqNvfVJqexH-88rX6VqkD0</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1660035438</pqid></control><display><type>article</type><title>Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study</title><source>Elsevier ScienceDirect Journals</source><creator>Houska, J. ; Kohout, J. ; Vlcek, J.</creator><creatorcontrib>Houska, J. ; Kohout, J. ; Vlcek, J.</creatorcontrib><description>Atomic structure, electronic structure and properties of ZrBCN materials were studied using ab-initio calculations. We focus on the effect of N and Zr content and compare our results with the characteristics of samples prepared by reactive magnetron sputtering. We find that the materials are characterized by a mixture of covalent and metallic bonding. The metallic-to-covalent ratio is primarily controlled by the N content, and well correlated with measured electrical resistivity. ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system. Hard nanostructure forms at high Zr and low N content, containing (i) pure ZrN and (ii) (theoretically predicted and experimentally observed) solid solution close to ZrB0.50N0.50. The results allow one to tailor ZrBCN compositions which can combine different functional properties, such as high thermal stability, high hardness and electrical conductivity. •Resistivity of ZrBCN films of various compositions spans from 10−6 to &gt;107Ωm.•Calculations show a mixture of metallic and covalent bonding controlled by [N].•ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system.•Calculations explain the presence of two crystalline phases at high [Zr] and low [N].•Results allow to tailor ZrBCN compositions combining different functional properties.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2013.07.010</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Ab-initio calculations ; Atomic structure ; Bonding ; Bonding structure ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Covalence ; Cross-disciplinary physics: materials science; rheology ; Deposition by sputtering ; Electrical conductivity ; Electrical resistivity ; Electronic band structure ; Electronic structure ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Exact sciences and technology ; Materials science ; Mathematical analysis ; Methods of deposition of films and coatings; film growth and epitaxy ; Nanoscale materials and structures: fabrication and characterization ; Nanostructure ; Other topics in nanoscale materials and structures ; Physical properties of thin films, nonelectronic ; Physics ; Resistivity ; Solid solutions ; Surface and interface electron states ; Surface states, band structure, electron density of states ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thermal stability; thermal effects ; ZrBCN materials</subject><ispartof>Thin solid films, 2013-09, Vol.542, p.225-231</ispartof><rights>2013 Elsevier B.V.</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c360t-2e728a692b86843a205625fef82f9c0b61a5c5a42ba8649dc4ae4b7d436097693</citedby><cites>FETCH-LOGICAL-c360t-2e728a692b86843a205625fef82f9c0b61a5c5a42ba8649dc4ae4b7d436097693</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S004060901301184X$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,776,780,3537,27901,27902,65306</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=27659516$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Houska, J.</creatorcontrib><creatorcontrib>Kohout, J.</creatorcontrib><creatorcontrib>Vlcek, J.</creatorcontrib><title>Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study</title><title>Thin solid films</title><description>Atomic structure, electronic structure and properties of ZrBCN materials were studied using ab-initio calculations. We focus on the effect of N and Zr content and compare our results with the characteristics of samples prepared by reactive magnetron sputtering. We find that the materials are characterized by a mixture of covalent and metallic bonding. The metallic-to-covalent ratio is primarily controlled by the N content, and well correlated with measured electrical resistivity. ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system. Hard nanostructure forms at high Zr and low N content, containing (i) pure ZrN and (ii) (theoretically predicted and experimentally observed) solid solution close to ZrB0.50N0.50. The results allow one to tailor ZrBCN compositions which can combine different functional properties, such as high thermal stability, high hardness and electrical conductivity. •Resistivity of ZrBCN films of various compositions spans from 10−6 to &gt;107Ωm.•Calculations show a mixture of metallic and covalent bonding controlled by [N].•ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system.•Calculations explain the presence of two crystalline phases at high [Zr] and low [N].•Results allow to tailor ZrBCN compositions combining different functional properties.</description><subject>Ab-initio calculations</subject><subject>Atomic structure</subject><subject>Bonding</subject><subject>Bonding structure</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Covalence</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Deposition by sputtering</subject><subject>Electrical conductivity</subject><subject>Electrical resistivity</subject><subject>Electronic band structure</subject><subject>Electronic structure</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Mathematical analysis</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Nanoscale materials and structures: fabrication and characterization</subject><subject>Nanostructure</subject><subject>Other topics in nanoscale materials and structures</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Resistivity</subject><subject>Solid solutions</subject><subject>Surface and interface electron states</subject><subject>Surface states, band structure, electron density of states</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thermal stability; thermal effects</subject><subject>ZrBCN materials</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNp9kM1KxDAURoMoOI4-gLtsBBe23qRt2upKB_9AdKMbNyFNbyBDJx2TVPDtzTiiO1eBm_N9uTmEHDPIGTBxvsxjMDkHVuRQ58Bgh8xYU7cZrwu2S2YAJWQCWtgnByEsAYBxXsxIuDEGdaSjoU9UuZ6-eapHF9GlmaMh-knHyeMZxSFxfnRW_02_E2s_rtFHi2HT8uavF090pSJ6q4ZwQa8cVV1mnY12TMmp_zwkeyZd4dHPOSevtzcvi_vs8fnuYXH1mOlCQMw41rxRouVdI5qyUBwqwSuDpuGm1dAJpipdqZJ3qhFl2-tSYdnVfZnSbS3aYk5Ot71pw_cJQ5QrGzQOg3I4TkEyIQCKqiyahLItqv0Ygkcj196ulP-UDORGsFzKJFhuBEuoZRKcMic_9SpoNRivnLbhN8hrUbUVE4m73HKY_vph0cugLTqNvfVJqexH-88rX6VqkD0</recordid><startdate>20130902</startdate><enddate>20130902</enddate><creator>Houska, J.</creator><creator>Kohout, J.</creator><creator>Vlcek, J.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130902</creationdate><title>Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study</title><author>Houska, J. ; Kohout, J. ; Vlcek, J.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c360t-2e728a692b86843a205625fef82f9c0b61a5c5a42ba8649dc4ae4b7d436097693</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Ab-initio calculations</topic><topic>Atomic structure</topic><topic>Bonding</topic><topic>Bonding structure</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Covalence</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Deposition by sputtering</topic><topic>Electrical conductivity</topic><topic>Electrical resistivity</topic><topic>Electronic band structure</topic><topic>Electronic structure</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Mathematical analysis</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Nanoscale materials and structures: fabrication and characterization</topic><topic>Nanostructure</topic><topic>Other topics in nanoscale materials and structures</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Resistivity</topic><topic>Solid solutions</topic><topic>Surface and interface electron states</topic><topic>Surface states, band structure, electron density of states</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thermal stability; thermal effects</topic><topic>ZrBCN materials</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Houska, J.</creatorcontrib><creatorcontrib>Kohout, J.</creatorcontrib><creatorcontrib>Vlcek, J.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Houska, J.</au><au>Kohout, J.</au><au>Vlcek, J.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study</atitle><jtitle>Thin solid films</jtitle><date>2013-09-02</date><risdate>2013</risdate><volume>542</volume><spage>225</spage><epage>231</epage><pages>225-231</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Atomic structure, electronic structure and properties of ZrBCN materials were studied using ab-initio calculations. We focus on the effect of N and Zr content and compare our results with the characteristics of samples prepared by reactive magnetron sputtering. We find that the materials are characterized by a mixture of covalent and metallic bonding. The metallic-to-covalent ratio is primarily controlled by the N content, and well correlated with measured electrical resistivity. ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system. Hard nanostructure forms at high Zr and low N content, containing (i) pure ZrN and (ii) (theoretically predicted and experimentally observed) solid solution close to ZrB0.50N0.50. The results allow one to tailor ZrBCN compositions which can combine different functional properties, such as high thermal stability, high hardness and electrical conductivity. •Resistivity of ZrBCN films of various compositions spans from 10−6 to &gt;107Ωm.•Calculations show a mixture of metallic and covalent bonding controlled by [N].•ZrN bonds have the highest preference to form out of all bonds in the ZrBCN system.•Calculations explain the presence of two crystalline phases at high [Zr] and low [N].•Results allow to tailor ZrBCN compositions combining different functional properties.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2013.07.010</doi><tpages>7</tpages></addata></record>
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subjects Ab-initio calculations
Atomic structure
Bonding
Bonding structure
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Condensed matter: structure, mechanical and thermal properties
Covalence
Cross-disciplinary physics: materials science
rheology
Deposition by sputtering
Electrical conductivity
Electrical resistivity
Electronic band structure
Electronic structure
Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures
Exact sciences and technology
Materials science
Mathematical analysis
Methods of deposition of films and coatings
film growth and epitaxy
Nanoscale materials and structures: fabrication and characterization
Nanostructure
Other topics in nanoscale materials and structures
Physical properties of thin films, nonelectronic
Physics
Resistivity
Solid solutions
Surface and interface electron states
Surface states, band structure, electron density of states
Surfaces and interfaces
thin films and whiskers (structure and nonelectronic properties)
Thermal stability
thermal effects
ZrBCN materials
title Effect of N and Zr content on structure, electronic structure and properties of ZrBCN materials: An ab-initio study
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-10T22%3A12%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Effect%20of%20N%20and%20Zr%20content%20on%20structure,%20electronic%20structure%20and%20properties%20of%20ZrBCN%20materials:%20An%20ab-initio%20study&rft.jtitle=Thin%20solid%20films&rft.au=Houska,%20J.&rft.date=2013-09-02&rft.volume=542&rft.spage=225&rft.epage=231&rft.pages=225-231&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/j.tsf.2013.07.010&rft_dat=%3Cproquest_cross%3E1660035438%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1660035438&rft_id=info:pmid/&rft_els_id=S004060901301184X&rfr_iscdi=true