Mitigation of organic laser damage precursors from chemical processing of fused silica

Increases in the laser damage threshold of fused silica have been driven by the successive elimination of near-surface damage precursors such as polishing residue, fractures, and inorganic salts. In this work, we show that trace impurities in ultrapure water used to process fused silica optics may b...

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Veröffentlicht in:	Optics express 2014-12, Vol.22 (24), p.29568-29577
Hauptverfasser:	Baxamusa, S, Miller, P E, Wong, L, Steele, R, Shen, N, Bude, J
Format:	Artikel
Sprache:	eng
Schlagworte:	Lasers Microscopy, Electron, Scanning Organic Chemicals - analysis Oxidation-Reduction Probability Silicon Dioxide - chemistry Temperature Water - chemistry
Online-Zugang:	Volltext
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