Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing
An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating age...
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| Veröffentlicht in: | Journal of synchrotron radiation 2015-01, Vol.22 (1), p.165-171 |
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| container_title | Journal of synchrotron radiation |
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| creator | Malfatti, Luca Pinna, Alessandra Enzo, Stefano Falcaro, Paolo Marmiroli, Benedetta Innocenzi, Plinio |
| description | An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology. |
| doi_str_mv | 10.1107/S1600577514024047 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_24P</sourceid><recordid>TN_cdi_proquest_miscellaneous_1651421547</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3536558531</sourcerecordid><originalsourceid>FETCH-LOGICAL-c5416-86e01b68bea245afecb814f1cb60358ea0a2f17fb60c5612a5cf28158c93fa883</originalsourceid><addsrcrecordid>eNqNkc9u1DAQxi0EoqXwAFyQJS5cArbjf8sNrUpbVLFFLSpwsZysvXFJ7GA7avdteBaeDK9SKgQHOHlm_Pu-0cwA8BSjlxgj8eocc4SYEAxTRCii4h7Y35WqXe3-b_EeeJTSFUKYC1I_BHuEsVpwRPdBupi88xuYOwPHTicDc9Q-ueyCh8HCL35V_pyH1vVDKmEM06aDvctd2EQ9dtvXUHvofDYlzWYNm5BzGKppLPX1j-85jNU6XHs4xtCalEqzx-CB1X0yT27fA_Dx7eHF8rg6XR2dLN-cVi2jmFeSG4QbLhujCWXamraRmFrcNhzVTBqNNLFY2JK2jGOiWWuJxEy2i9pqKesD8GL2La2_TSZlNbjUmr7X3oQpKczL4ghmVPwHWtYrERGLgj7_A70KU_RlkJmiNUekUHim2hhSisaqMbpBx63CSO2Op_46XtE8u3WemsGs7xS_rlWAxQxcu95s_-2o3p1_JssVQ4wXbTVrXcrm5k6r41fFRS2Yunx_pD7RD1henp2p4_oneWm0qQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1640443602</pqid></control><display><type>article</type><title>Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing</title><source>Wiley Online Library Open Access</source><creator>Malfatti, Luca ; Pinna, Alessandra ; Enzo, Stefano ; Falcaro, Paolo ; Marmiroli, Benedetta ; Innocenzi, Plinio</creator><creatorcontrib>Malfatti, Luca ; Pinna, Alessandra ; Enzo, Stefano ; Falcaro, Paolo ; Marmiroli, Benedetta ; Innocenzi, Plinio</creatorcontrib><description>An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.</description><identifier>ISSN: 1600-5775</identifier><identifier>ISSN: 0909-0495</identifier><identifier>EISSN: 1600-5775</identifier><identifier>DOI: 10.1107/S1600577514024047</identifier><identifier>PMID: 25537604</identifier><language>eng</language><publisher>5 Abbey Square, Chester, Cheshire CH1 2HU, England: International Union of Crystallography</publisher><subject>Arrays ; bottom-up/top-down ; Deposition ; Exposure ; Lithography ; sol-gel ; thin film ; Thin films ; Tuning ; X-rays ; Zinc oxide ; Zinc oxides</subject><ispartof>Journal of synchrotron radiation, 2015-01, Vol.22 (1), p.165-171</ispartof><rights>International Union of Crystallography, 2015</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c5416-86e01b68bea245afecb814f1cb60358ea0a2f17fb60c5612a5cf28158c93fa883</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1107%2FS1600577514024047$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1107%2FS1600577514024047$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,11541,27901,27902,45550,45551,46027,46451</link.rule.ids><linktorsrc>$$Uhttps://onlinelibrary.wiley.com/doi/abs/10.1107%2FS1600577514024047$$EView_record_in_Wiley-Blackwell$$FView_record_in_$$GWiley-Blackwell</linktorsrc><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/25537604$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Malfatti, Luca</creatorcontrib><creatorcontrib>Pinna, Alessandra</creatorcontrib><creatorcontrib>Enzo, Stefano</creatorcontrib><creatorcontrib>Falcaro, Paolo</creatorcontrib><creatorcontrib>Marmiroli, Benedetta</creatorcontrib><creatorcontrib>Innocenzi, Plinio</creatorcontrib><title>Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing</title><title>Journal of synchrotron radiation</title><addtitle>Jnl of Synchrotron Radiation</addtitle><description>An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.</description><subject>Arrays</subject><subject>bottom-up/top-down</subject><subject>Deposition</subject><subject>Exposure</subject><subject>Lithography</subject><subject>sol-gel</subject><subject>thin film</subject><subject>Thin films</subject><subject>Tuning</subject><subject>X-rays</subject><subject>Zinc oxide</subject><subject>Zinc oxides</subject><issn>1600-5775</issn><issn>0909-0495</issn><issn>1600-5775</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2015</creationdate><recordtype>article</recordtype><recordid>eNqNkc9u1DAQxi0EoqXwAFyQJS5cArbjf8sNrUpbVLFFLSpwsZysvXFJ7GA7avdteBaeDK9SKgQHOHlm_Pu-0cwA8BSjlxgj8eocc4SYEAxTRCii4h7Y35WqXe3-b_EeeJTSFUKYC1I_BHuEsVpwRPdBupi88xuYOwPHTicDc9Q-ueyCh8HCL35V_pyH1vVDKmEM06aDvctd2EQ9dtvXUHvofDYlzWYNm5BzGKppLPX1j-85jNU6XHs4xtCalEqzx-CB1X0yT27fA_Dx7eHF8rg6XR2dLN-cVi2jmFeSG4QbLhujCWXamraRmFrcNhzVTBqNNLFY2JK2jGOiWWuJxEy2i9pqKesD8GL2La2_TSZlNbjUmr7X3oQpKczL4ghmVPwHWtYrERGLgj7_A70KU_RlkJmiNUekUHim2hhSisaqMbpBx63CSO2Op_46XtE8u3WemsGs7xS_rlWAxQxcu95s_-2o3p1_JssVQ4wXbTVrXcrm5k6r41fFRS2Yunx_pD7RD1henp2p4_oneWm0qQ</recordid><startdate>20150101</startdate><enddate>20150101</enddate><creator>Malfatti, Luca</creator><creator>Pinna, Alessandra</creator><creator>Enzo, Stefano</creator><creator>Falcaro, Paolo</creator><creator>Marmiroli, Benedetta</creator><creator>Innocenzi, Plinio</creator><general>International Union of Crystallography</general><general>John Wiley & Sons, Inc</general><scope>BSCLL</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8FD</scope><scope>JQ2</scope><scope>L7M</scope><scope>7X8</scope></search><sort><creationdate>20150101</creationdate><title>Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing</title><author>Malfatti, Luca ; Pinna, Alessandra ; Enzo, Stefano ; Falcaro, Paolo ; Marmiroli, Benedetta ; Innocenzi, Plinio</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c5416-86e01b68bea245afecb814f1cb60358ea0a2f17fb60c5612a5cf28158c93fa883</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2015</creationdate><topic>Arrays</topic><topic>bottom-up/top-down</topic><topic>Deposition</topic><topic>Exposure</topic><topic>Lithography</topic><topic>sol-gel</topic><topic>thin film</topic><topic>Thin films</topic><topic>Tuning</topic><topic>X-rays</topic><topic>Zinc oxide</topic><topic>Zinc oxides</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Malfatti, Luca</creatorcontrib><creatorcontrib>Pinna, Alessandra</creatorcontrib><creatorcontrib>Enzo, Stefano</creatorcontrib><creatorcontrib>Falcaro, Paolo</creatorcontrib><creatorcontrib>Marmiroli, Benedetta</creatorcontrib><creatorcontrib>Innocenzi, Plinio</creatorcontrib><collection>Istex</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>ProQuest Computer Science Collection</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>MEDLINE - Academic</collection><jtitle>Journal of synchrotron radiation</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Malfatti, Luca</au><au>Pinna, Alessandra</au><au>Enzo, Stefano</au><au>Falcaro, Paolo</au><au>Marmiroli, Benedetta</au><au>Innocenzi, Plinio</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing</atitle><jtitle>Journal of synchrotron radiation</jtitle><addtitle>Jnl of Synchrotron Radiation</addtitle><date>2015-01-01</date><risdate>2015</risdate><volume>22</volume><issue>1</issue><spage>165</spage><epage>171</epage><pages>165-171</pages><issn>1600-5775</issn><issn>0909-0495</issn><eissn>1600-5775</eissn><abstract>An innovative approach towards the physico‐chemical tailoring of zinc oxide thin films is reported. The films have been deposited by liquid phase using the sol–gel method and then exposed to hard X‐rays, provided by a synchrotron storage ring, for lithography. The use of surfactant and chelating agents in the sol allows easy‐to‐pattern films made by an organic–inorganic matrix to be deposited. The exposure to hard X‐rays strongly affects the nucleation and growth of crystalline ZnO, triggering the formation of two intermediate phases before obtaining a wurtzite‐like structure. At the same time, X‐ray lithography allows for a fast patterning of the coatings enabling microfabrication for sensing and arrays technology.</abstract><cop>5 Abbey Square, Chester, Cheshire CH1 2HU, England</cop><pub>International Union of Crystallography</pub><pmid>25537604</pmid><doi>10.1107/S1600577514024047</doi><tpages>7</tpages><oa>free_for_read</oa></addata></record> |
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| issn | 1600-5775 0909-0495 1600-5775 |
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| subjects | Arrays bottom-up/top-down Deposition Exposure Lithography sol-gel thin film Thin films Tuning X-rays Zinc oxide Zinc oxides |
| title | Tuning the phase transition of ZnO thin films through lithography: an integrated bottom-up and top-down processing |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T20%3A22%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_24P&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Tuning%20the%20phase%20transition%20of%20ZnO%20thin%20films%20through%20lithography:%20an%20integrated%20bottom-up%20and%C2%A0top-down%20processing&rft.jtitle=Journal%20of%20synchrotron%20radiation&rft.au=Malfatti,%20Luca&rft.date=2015-01-01&rft.volume=22&rft.issue=1&rft.spage=165&rft.epage=171&rft.pages=165-171&rft.issn=1600-5775&rft.eissn=1600-5775&rft_id=info:doi/10.1107/S1600577514024047&rft_dat=%3Cproquest_24P%3E3536558531%3C/proquest_24P%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1640443602&rft_id=info:pmid/25537604&rfr_iscdi=true |