Evaluation of chemical kinetics in positive photoresists using laser desorption ionization

[Display omitted] •Photoresist is an important material in the optic and microelectronic industries.•Study of chemical kinetics of positive photoresist when exposed to UV radiation.•Dill C parameter measurement in positive photoresists with the LDI-ToF-MS technique. Positive photoresists are photose...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	European polymer journal 2014-10, Vol.59, p.1-7
Hauptverfasser:	Martins, J.S., Borges, B.G.A.L., Machado, R.C., Carpanez, A.G., Grazul, R.M., Zappa, F., Melo, W.S., Rocco, M.L.M., Pinho, R.R., Lima, C.R.A.
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Arc lamps Crosslinking and degradation Desorption Dill C parameter Exact sciences and technology Exposure Ionization Lasers Mass spectrometry Photoresist Photoresists Photosensitivity Physicochemistry of polymers Polymers and radiations Reaction kinetics Time-of-flight
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!