Influence of network bond percolation on the thermal, mechanical, electrical and optical properties of high and low-k a-SiC:H thin films

As demand for lower power and higher performance nano-electronic products increases, the semiconductor industry must adopt insulating materials with progressively lower dielectric constants (i.e. low-k) in order to minimize capacitive related power losses in integrated circuits. However in addition...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of non-crystalline solids 2013-11, Vol.379, p.67-79
Hauptverfasser: King, Sean W., Bielefeld, Jeff, Xu, Guanghai, Lanford, William A., Matsuda, Yusuke, Dauskardt, Reinhold H., Kim, Namjun, Hondongwa, Donald, Olasov, Lauren, Daly, Brian, Stan, Gheorghe, Liu, Ming, Dutta, Dhanadeep, Gidley, David
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!