Effect of deposition pressure on mechanical properties of Al-Mg-B thin films

This work explored the effect of deposition pressure on the properties of the ternary Al-Mg-B thin films deposited on Si substrate at high deposition temperature (600°C) by magnetron sputtering system with one pure boron target and one Al/Mg co-target. The influences of the deposition pressure on th...

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Veröffentlicht in:	Surface engineering 2014-12, Vol.30 (12), p.900-904
Hauptverfasser:	Kang, R. F., Bai, Y. Z., Qin, F. W., Zhao, Y., Pang, J. Q., Zhao, J.
Format:	Artikel
Sprache:	eng
Schlagworte:	Aluminum Amorphous Deposition Fourier transforms Hardness Infrared spectroscopy Magnetron sputtering Mechanical properties Roughness Thickness Thin films Three dimensional
Online-Zugang:	Volltext
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