Preparation of high laser-induced damage threshold Ta2O5 films

•High LIDT Ta2O5 films were prepared using TaCl5 as precursor.•We revealed the functions of H2O2 in the sol formation.•The high LIDT was attributed to the nearly free of defects. High laser-induced damage threshold (LIDT) Ta2O5 films were prepared by the sol–gel method using TaCl5 as a new precursor...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Applied surface science 2014-08, Vol.309, p.194-199
Hauptverfasser:	Xu, Cheng, Yi, Peng, Fan, Heliang, Qi, Jianwei, Yang, Shuai, Qiang, Yinghuai, Liu, Jiongtian, Li, Dawei
Format:	Artikel
Sprache:	eng
Schlagworte:	Absorption Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Damage Defects Exact sciences and technology Fourier transforms Infrared Laser damage Optical properties Physics Surface chemistry Surface roughness Ta2O5 films Tantalum oxides Thresholds
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!