Patterned deposition of thin SiOX-films by laser induced forward transfer

Well defined regions of silicon suboxide (SiOx) thin films deposited on fused silica substrates by vacuum evaporation are transferred to a receiver substrate by pulsed laser induced forward transfer. The receiver substrate (fused silica, polycarbonate or polydimethylsiloxane) is pressed against the...

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Veröffentlicht in:	Thin solid films 2014-01, Vol.550, p.521-524
Hauptverfasser:	Ihlemann, J., Weichenhain-Schriever, R.
Format:	Artikel
Sprache:	eng
Schlagworte:	Coating Condensed matter: structure, mechanical and thermal properties Congruent transfer Deposition Exact sciences and technology Fused silica Irradiation Laser induced forward transfer Lasers Masks Physical radiation effects, radiation damage Physics Silicon dioxide Silicon oxide Silicon substrates Structure and morphology thickness Structure of solids and liquids crystallography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology Woodpile pattern
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