Effects of the temperature and beam parameters on depth profiles in X-ray photoelectron spectrometry and secondary ion mass spectrometry under C60+–Ar+ cosputtering

[Display omitted] •XPS and SIMS depth profiles of PMMA were acquired concurrently with C60+–Ar+ cosputtering.•Artificial signal enhancement at the interface was observed in SIMS when using C60+ sputtering.•Optimized cosputtering yielded higher SIMS intensities and removed the artificial enhancement....

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Veröffentlicht in:	Analytica chimica acta 2014-12, Vol.852, p.129-136
Hauptverfasser:	Liao, Hua-Yang, Tsai, Meng-Hung, Kao, Wei-Lun, Kuo, Ding-Yuan, Shyue, Jing-Jong
Format:	Artikel
Sprache:	eng
Schlagworte:	C60+-sputtering Cluster ion Depth profiles Secondary ion mass spectrometry (SIMS) Temperature effect X-ray photoelectron spectrometry (XPS)
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