Investigation of Optical, Electrical, and Mechanical Properties of MOCVD-grown ZrO sub(2) Films

Metal-organic (MO)CVD of ZrO sub(2) thin films is performed using the precursor [Zr(NMe sub(2)) sub(2)(guan) sub(2)] (guan= eta super(2)-( super(i)PrN) sub(2)CNMe sub(2)) as the Zr source, together with oxygen. Film deposition is carried out on both Si(100) and glass substrates at various deposition...

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Veröffentlicht in:	Chemical vapor deposition 2014-09, Vol.20 (7-8-9), p.320-327
Hauptverfasser:	Dang, Van-Son, Banerjee, Manish, Zhu, Huaizhi, Srinivasan, Nagendra Babu, Parala, Harish, Pfetzing-Micklich, Janine, Wieck, Andreas D, Devi, Anjana
Format:	Artikel
Sprache:	eng
Schlagworte:	Deposition Glass Mechanical properties Optical properties Precursors Silicon substrates Thin films Zirconium dioxide
Online-Zugang:	Volltext
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