Organic-Inorganic Thin Films from TiCl sub(4) and 4-Aminophenol Precursors: A Model Case of ALD/MLD Hybrid-Material Growth?

Atomic layer deposition (ALD) is a sophisticated thin-film production technology for relatively simple inorganic materials based on sequential self-saturated surface reactions. Combining ALD with molecular layer deposition (MLD) - a variant of ALD based on purely organic precursors - offers in princ...

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Veröffentlicht in:	European journal of inorganic chemistry 2014-02, Vol.2014 (6), p.968-974
Hauptverfasser:	Sundberg, Pia, Karppinen, Maarit
Format:	Artikel
Sprache:	eng
Schlagworte:	Backbone Density Deposition Precursors Surface reactions Thin films Titanium X-ray photoelectron spectroscopy
Online-Zugang:	Volltext
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