On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles

We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct...

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Veröffentlicht in:	Plasma processes and polymers 2014-06, Vol.11 (6), p.571-576
Hauptverfasser:	Alvarez, Rafael, Garcia-Martin, Jose M., Lopez-Santos, Maria C., Rico, Victor, Ferrer, Francisco J., Cotrino, Jose, Gonzalez-Elipe, Agustin R., Palmero, Alberto
Format:	Artikel
Sprache:	eng
Schlagworte:	Accuracy Camber Deposition deposition rates Magnetron sputtering Mathematical models Mean free path modeling oblique angle deposition R&D Research & development Solar energy Thin films Tilt
Online-Zugang:	Volltext
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