On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles
We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct...
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| Veröffentlicht in: | Plasma processes and polymers 2014-06, Vol.11 (6), p.571-576 |
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| container_title | Plasma processes and polymers |
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| creator | Alvarez, Rafael Garcia-Martin, Jose M. Lopez-Santos, Maria C. Rico, Victor Ferrer, Francisco J. Cotrino, Jose Gonzalez-Elipe, Agustin R. Palmero, Alberto |
| description | We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key parameter defining the balance between ballistic and diffusive flows in the deposition reactor. The good agreement between experimental and calculated results supports the validity of our description, which becomes a useful tool to explain the main features of the magnetron sputtering deposition of thin films at oblique angles.
A simple formula relating the deposition rates for the magnetron sputtered thin films at oblique angles, the background pressure of the gases and the tilt angles of the substrate is derived for general conditions. This formula is experimentally tested, finding a good agreement in all the studied cases, even in conditions where the Keller–Simmons formula is not applicable. |
| doi_str_mv | 10.1002/ppap.201300201 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1551115923</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>3336861101</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4281-b254e653ba99e512dc54c5ef574e6c081e96bfc0c32c71068f8497c442f2a40a3</originalsourceid><addsrcrecordid>eNqFkDtPwzAURiMEElBYmS2xsKT4nWSsCi0ISstLjJbr3lCXNAm2K-Df46qoQixM1_fTObb1JckJwV2CMT1vW912KSYsLpjsJAdEEprmuSx2t2eB95ND7xcYMyxyfJDcjGsU5oAuoG28Dbap0YMO4FFTopF-rSG4GD22qxDAwQw9zW2NBrZaeqQDGk8r-74C1KtfK_BHyV6pKw_HP7OTPA8un_pX6e14eN3v3aaG05ykUyo4SMGmuihAEDozghsBpchibHBOoJDT0mDDqMkIlnmZ8yIznNOSao416yRnm3tb18TXfVBL6w1Ula6hWXlFhCCEiIKyiJ7-QRfNytXxd5FiMhMZ4TJS3Q1lXOO9g1K1zi61-1IEq3W3at2t2nYbhWIjfNgKvv6h1WTSm_x2041rfYDPravdm5IZy4R6uRsq2R--3PN-oUbsG7MfisA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1536757146</pqid></control><display><type>article</type><title>On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Alvarez, Rafael ; Garcia-Martin, Jose M. ; Lopez-Santos, Maria C. ; Rico, Victor ; Ferrer, Francisco J. ; Cotrino, Jose ; Gonzalez-Elipe, Agustin R. ; Palmero, Alberto</creator><creatorcontrib>Alvarez, Rafael ; Garcia-Martin, Jose M. ; Lopez-Santos, Maria C. ; Rico, Victor ; Ferrer, Francisco J. ; Cotrino, Jose ; Gonzalez-Elipe, Agustin R. ; Palmero, Alberto</creatorcontrib><description>We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key parameter defining the balance between ballistic and diffusive flows in the deposition reactor. The good agreement between experimental and calculated results supports the validity of our description, which becomes a useful tool to explain the main features of the magnetron sputtering deposition of thin films at oblique angles.
A simple formula relating the deposition rates for the magnetron sputtered thin films at oblique angles, the background pressure of the gases and the tilt angles of the substrate is derived for general conditions. This formula is experimentally tested, finding a good agreement in all the studied cases, even in conditions where the Keller–Simmons formula is not applicable.</description><identifier>ISSN: 1612-8850</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.201300201</identifier><language>eng</language><publisher>Weinheim: Blackwell Publishing Ltd</publisher><subject>Accuracy ; Camber ; Deposition ; deposition rates ; Magnetron sputtering ; Mathematical models ; Mean free path ; modeling ; oblique angle deposition ; R&D ; Research & development ; Solar energy ; Thin films ; Tilt</subject><ispartof>Plasma processes and polymers, 2014-06, Vol.11 (6), p.571-576</ispartof><rights>2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4281-b254e653ba99e512dc54c5ef574e6c081e96bfc0c32c71068f8497c442f2a40a3</citedby><cites>FETCH-LOGICAL-c4281-b254e653ba99e512dc54c5ef574e6c081e96bfc0c32c71068f8497c442f2a40a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.201300201$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.201300201$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27903,27904,45553,45554</link.rule.ids></links><search><creatorcontrib>Alvarez, Rafael</creatorcontrib><creatorcontrib>Garcia-Martin, Jose M.</creatorcontrib><creatorcontrib>Lopez-Santos, Maria C.</creatorcontrib><creatorcontrib>Rico, Victor</creatorcontrib><creatorcontrib>Ferrer, Francisco J.</creatorcontrib><creatorcontrib>Cotrino, Jose</creatorcontrib><creatorcontrib>Gonzalez-Elipe, Agustin R.</creatorcontrib><creatorcontrib>Palmero, Alberto</creatorcontrib><title>On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles</title><title>Plasma processes and polymers</title><addtitle>Plasma Process. Polym</addtitle><description>We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key parameter defining the balance between ballistic and diffusive flows in the deposition reactor. The good agreement between experimental and calculated results supports the validity of our description, which becomes a useful tool to explain the main features of the magnetron sputtering deposition of thin films at oblique angles.
A simple formula relating the deposition rates for the magnetron sputtered thin films at oblique angles, the background pressure of the gases and the tilt angles of the substrate is derived for general conditions. This formula is experimentally tested, finding a good agreement in all the studied cases, even in conditions where the Keller–Simmons formula is not applicable.</description><subject>Accuracy</subject><subject>Camber</subject><subject>Deposition</subject><subject>deposition rates</subject><subject>Magnetron sputtering</subject><subject>Mathematical models</subject><subject>Mean free path</subject><subject>modeling</subject><subject>oblique angle deposition</subject><subject>R&D</subject><subject>Research & development</subject><subject>Solar energy</subject><subject>Thin films</subject><subject>Tilt</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNqFkDtPwzAURiMEElBYmS2xsKT4nWSsCi0ISstLjJbr3lCXNAm2K-Df46qoQixM1_fTObb1JckJwV2CMT1vW912KSYsLpjsJAdEEprmuSx2t2eB95ND7xcYMyxyfJDcjGsU5oAuoG28Dbap0YMO4FFTopF-rSG4GD22qxDAwQw9zW2NBrZaeqQDGk8r-74C1KtfK_BHyV6pKw_HP7OTPA8un_pX6e14eN3v3aaG05ykUyo4SMGmuihAEDozghsBpchibHBOoJDT0mDDqMkIlnmZ8yIznNOSao416yRnm3tb18TXfVBL6w1Ula6hWXlFhCCEiIKyiJ7-QRfNytXxd5FiMhMZ4TJS3Q1lXOO9g1K1zi61-1IEq3W3at2t2nYbhWIjfNgKvv6h1WTSm_x2041rfYDPravdm5IZy4R6uRsq2R--3PN-oUbsG7MfisA</recordid><startdate>201406</startdate><enddate>201406</enddate><creator>Alvarez, Rafael</creator><creator>Garcia-Martin, Jose M.</creator><creator>Lopez-Santos, Maria C.</creator><creator>Rico, Victor</creator><creator>Ferrer, Francisco J.</creator><creator>Cotrino, Jose</creator><creator>Gonzalez-Elipe, Agustin R.</creator><creator>Palmero, Alberto</creator><general>Blackwell Publishing Ltd</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope><scope>7U5</scope><scope>L7M</scope></search><sort><creationdate>201406</creationdate><title>On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles</title><author>Alvarez, Rafael ; Garcia-Martin, Jose M. ; Lopez-Santos, Maria C. ; Rico, Victor ; Ferrer, Francisco J. ; Cotrino, Jose ; Gonzalez-Elipe, Agustin R. ; Palmero, Alberto</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4281-b254e653ba99e512dc54c5ef574e6c081e96bfc0c32c71068f8497c442f2a40a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>Accuracy</topic><topic>Camber</topic><topic>Deposition</topic><topic>deposition rates</topic><topic>Magnetron sputtering</topic><topic>Mathematical models</topic><topic>Mean free path</topic><topic>modeling</topic><topic>oblique angle deposition</topic><topic>R&D</topic><topic>Research & development</topic><topic>Solar energy</topic><topic>Thin films</topic><topic>Tilt</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Alvarez, Rafael</creatorcontrib><creatorcontrib>Garcia-Martin, Jose M.</creatorcontrib><creatorcontrib>Lopez-Santos, Maria C.</creatorcontrib><creatorcontrib>Rico, Victor</creatorcontrib><creatorcontrib>Ferrer, Francisco J.</creatorcontrib><creatorcontrib>Cotrino, Jose</creatorcontrib><creatorcontrib>Gonzalez-Elipe, Agustin R.</creatorcontrib><creatorcontrib>Palmero, Alberto</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Alvarez, Rafael</au><au>Garcia-Martin, Jose M.</au><au>Lopez-Santos, Maria C.</au><au>Rico, Victor</au><au>Ferrer, Francisco J.</au><au>Cotrino, Jose</au><au>Gonzalez-Elipe, Agustin R.</au><au>Palmero, Alberto</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Process. Polym</addtitle><date>2014-06</date><risdate>2014</risdate><volume>11</volume><issue>6</issue><spage>571</spage><epage>576</epage><pages>571-576</pages><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>We describe here the deposition of thin films using magnetron sputtering at oblique angles. General relations between the deposition rates of the films and experimental parameters, such as gas pressure or substrate tilt angles, are deduced and experimentally tested. The model also permits the direct determination of the thermalization mean free path of the sputtered particles in the plasma gas, a key parameter defining the balance between ballistic and diffusive flows in the deposition reactor. The good agreement between experimental and calculated results supports the validity of our description, which becomes a useful tool to explain the main features of the magnetron sputtering deposition of thin films at oblique angles.
A simple formula relating the deposition rates for the magnetron sputtered thin films at oblique angles, the background pressure of the gases and the tilt angles of the substrate is derived for general conditions. This formula is experimentally tested, finding a good agreement in all the studied cases, even in conditions where the Keller–Simmons formula is not applicable.</abstract><cop>Weinheim</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1002/ppap.201300201</doi><tpages>6</tpages><oa>free_for_read</oa></addata></record> |
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| source | Wiley Online Library Journals Frontfile Complete |
| subjects | Accuracy Camber Deposition deposition rates Magnetron sputtering Mathematical models Mean free path modeling oblique angle deposition R&D Research & development Solar energy Thin films Tilt |
| title | On the Deposition Rates of Magnetron Sputtered Thin Films at Oblique Angles |
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