The microstructure and properties of energetically deposited carbon nitride films

The intrinsic stress, film density and nitrogen content of carbon nitride (CNx) films deposited from a filtered cathodic vacuum arc were determined as a function of substrate bias, substrate temperature and nitrogen process pressure. Contour plots of the measurements show the deposition conditions r...

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Veröffentlicht in:	Diamond and related materials 2014-05, Vol.45, p.58-63
Hauptverfasser:	Sadek, A.Z., Kracica, M., Moafi, A., Lau, D.W.M., Partridge, J.G., McCulloch, D.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Arc deposition Bias Bonding Carbon Carbon nitride Cathodic arc CNx Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Density Deposition Energetic deposition Exact sciences and technology Fullerenes and related materials diamonds, graphite Materials science Mechanical and acoustical properties Methods of deposition of films and coatings film growth and epitaxy N-doped carbon Physical properties of thin films, nonelectronic Physics Specific materials Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Tantalum Theory and models of film growth Thin film structure and morphology
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