Wafer-scale directed self-assembly of nanostructures using self-assembled monolayer based controlled-wetting
Wet-able and non-wet-able patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and sim...
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Veröffentlicht in: | Colloids and surfaces. A, Physicochemical and engineering aspects Physicochemical and engineering aspects, 2013-09, Vol.436, p.1076-1082 |
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Sprache: | eng |
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