Wafer-scale directed self-assembly of nanostructures using self-assembled monolayer based controlled-wetting

Wet-able and non-wet-able patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and sim...

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Veröffentlicht in:Colloids and surfaces. A, Physicochemical and engineering aspects Physicochemical and engineering aspects, 2013-09, Vol.436, p.1076-1082
1. Verfasser: Rao, Saleem G.
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description Wet-able and non-wet-able patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and simple scratch techniques were used to create SAM patterns of different shapes and sizes. Dipping the SAM patterned surface in the NS solution or by putting a droplet of the NS solution on the patterned surface the NS assembled according to SAM patterns only in the wettable , Au/silicon regions. I observed that wettability behavior of the surface plays a dominant role in the NS assembly in comparison to van der Waals’ and other interactions between surface and the NS. •Directed assembly of NSs by controlling surface wetting properties.•Wet-able and non-wet-able patterned regions creation using SAM.•Non-polar SAM does not allow NS binding due to its non-wet-able behavior.•NS assembly according to SAM patterns only in wet-able regions.•Observations reveal a direct correlation between the NS assembly and the surface wettability. Controlled spatial placement of nanostructure (NS) at micro/nano scale has attracted much attention since the last decade due to their applications in NS based device fabrication. Different processes like, chemical interaction based to solvent driven patterned assembly of NS have been reported. This work is about the large scale patterned assembly of different NS; cobalt and diamond nano particles and ZnO nanorods at micro/nano scale by controlling the surface wetting properties. Wettable and non-wettable patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and simple scratch techniques were used to create SAM patterns of different shapes and sizes. Dipping the SAM patterned surface in the NS solution or by putting a droplet of the NS solution on the patterned surface the NS assembled according to SAM patterns only in the wettable, Au/silicon regions. I observed that wettability behavior of the surface plays a dominant role in the NS assembly in comparison to van der Waals’ and other interactions between surface and the NS.
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I observed that wettability behavior of the surface plays a dominant role in the NS assembly in comparison to van der Waals’ and other interactions between surface and the NS. •Directed assembly of NSs by controlling surface wetting properties.•Wet-able and non-wet-able patterned regions creation using SAM.•Non-polar SAM does not allow NS binding due to its non-wet-able behavior.•NS assembly according to SAM patterns only in wet-able regions.•Observations reveal a direct correlation between the NS assembly and the surface wettability. Controlled spatial placement of nanostructure (NS) at micro/nano scale has attracted much attention since the last decade due to their applications in NS based device fabrication. Different processes like, chemical interaction based to solvent driven patterned assembly of NS have been reported. This work is about the large scale patterned assembly of different NS; cobalt and diamond nano particles and ZnO nanorods at micro/nano scale by controlling the surface wetting properties. Wettable and non-wettable patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and simple scratch techniques were used to create SAM patterns of different shapes and sizes. Dipping the SAM patterned surface in the NS solution or by putting a droplet of the NS solution on the patterned surface the NS assembled according to SAM patterns only in the wettable, Au/silicon regions. 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A, Physicochemical and engineering aspects</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Rao, Saleem G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Wafer-scale directed self-assembly of nanostructures using self-assembled monolayer based controlled-wetting</atitle><jtitle>Colloids and surfaces. A, Physicochemical and engineering aspects</jtitle><date>2013-09-05</date><risdate>2013</risdate><volume>436</volume><spage>1076</spage><epage>1082</epage><pages>1076-1082</pages><issn>0927-7757</issn><eissn>1873-4359</eissn><abstract>Wet-able and non-wet-able patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and simple scratch techniques were used to create SAM patterns of different shapes and sizes. Dipping the SAM patterned surface in the NS solution or by putting a droplet of the NS solution on the patterned surface the NS assembled according to SAM patterns only in the wettable , Au/silicon regions. I observed that wettability behavior of the surface plays a dominant role in the NS assembly in comparison to van der Waals’ and other interactions between surface and the NS. •Directed assembly of NSs by controlling surface wetting properties.•Wet-able and non-wet-able patterned regions creation using SAM.•Non-polar SAM does not allow NS binding due to its non-wet-able behavior.•NS assembly according to SAM patterns only in wet-able regions.•Observations reveal a direct correlation between the NS assembly and the surface wettability. Controlled spatial placement of nanostructure (NS) at micro/nano scale has attracted much attention since the last decade due to their applications in NS based device fabrication. Different processes like, chemical interaction based to solvent driven patterned assembly of NS have been reported. This work is about the large scale patterned assembly of different NS; cobalt and diamond nano particles and ZnO nanorods at micro/nano scale by controlling the surface wetting properties. Wettable and non-wettable patterned regions were created on gold/silicon surface using patterns of self-assembled monolayer (SAM). Patterns of SAMs with terminal end of CH3 were used to create non-wettable regions on wettable gold/silicon surfaces. Micro-contact printing, e-beam lithography, and simple scratch techniques were used to create SAM patterns of different shapes and sizes. Dipping the SAM patterned surface in the NS solution or by putting a droplet of the NS solution on the patterned surface the NS assembled according to SAM patterns only in the wettable, Au/silicon regions. I observed that wettability behavior of the surface plays a dominant role in the NS assembly in comparison to van der Waals’ and other interactions between surface and the NS.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.colsurfa.2013.08.050</doi><tpages>7</tpages></addata></record>
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subjects Assembly
Cobalt nano-particles
Directed self-assembly
Droplets
Gold
Nano-diamonds
Nanostructure
Nanostructures patterned assembly
Self assembly
Self-assembled monolayer
Self-assembled monolayers
Silicon
Wettability
title Wafer-scale directed self-assembly of nanostructures using self-assembled monolayer based controlled-wetting
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