Structural and photocatalytic study of titanium dioxide films deposited by DC sputtering

Titanium dioxide (TiO2) thin films were deposited by DC magnetron sputtering (DMS) using an orthogonal experimental design approach. The optimized parameters were investigated. At the optimized condition, TiO2 film was fabricated by the energy filtrating magnetron sputtering (EFMS) technique. The cr...

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Veröffentlicht in:	Materials science in semiconductor processing 2014-05, Vol.21, p.91-97
Hauptverfasser:	Wang, Zhaoyong, Yao, Ning, Hu, Xing, Shi, Xinwei
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemistry Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Deposition Deposition by sputtering Direct current Energy filtrating Exact sciences and technology General and physical chemistry Magnetron sputtering Materials science Methods of deposition of films and coatings film growth and epitaxy Morphology Photocatalysis Photochemistry Physical chemistry of induced reactions (with radiations, particles and ultrasonics) Physics Scanning electron microscopy Semiconductors Solid surfaces and solid-solid interfaces Structure of solids and liquids crystallography Structure of specific crystalline solids Surface chemistry Surface structure and topography Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) TiO2 film Titanium dioxide
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