Hybrid lithography: combining UV-exposure and two photon direct laser writing
We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-...
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| Veröffentlicht in: | Optics express 2013-12, Vol.21 (24), p.29921-29926 |
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| container_end_page | 29926 |
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| container_issue | 24 |
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| container_title | Optics express |
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| creator | Eschenbaum, Carsten Großmann, Daniel Dopf, Katja Kettlitz, Siegfried Bocksrocker, Tobias Valouch, Sebastian Lemmer, Uli |
| description | We demonstrate a method for the combination of UV-lithography and direct laser writing using two-photon polymerization (2PP-DLW). First a dye doped photoresist is used for UV-lithography. Adding an undoped photoresist on top of the developed structures enables three-dimensional alignment of the 2PP-DLW structures by detecting the spatially varying fluorescence of the two photoresists. Using this approach we show three dimensional alignment by adding 3D structures made by 2PP-DLW to a previously UV-exposed structure. Furthermore, a fluidic system with an integrated total internal reflection mirror to observe particles in a microfluidic channel is demonstrated. |
| doi_str_mv | 10.1364/OE.21.029921 |
| format | Article |
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| ispartof | Optics express, 2013-12, Vol.21 (24), p.29921-29926 |
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| source | MEDLINE; DOAJ Directory of Open Access Journals; Elektronische Zeitschriftenbibliothek - Frei zugängliche E-Journals; Alma/SFX Local Collection |
| subjects | Equipment Design Equipment Failure Analysis Lenses Materials Testing Microfluidic Analytical Techniques - instrumentation Molecular Imprinting - methods Photography - methods Photons Polymers - chemistry Polymers - radiation effects Surface Properties - radiation effects Ultraviolet Rays |
| title | Hybrid lithography: combining UV-exposure and two photon direct laser writing |
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