Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave
An innovative technique, i.e., creating a traveling wave by launching two specific standing waves at the same time, is proposed to generate uniform large‐area very high frequency (VHF) plasmas. The viability of this approach has been verified by numerical simulation in this study. The electric field...
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Veröffentlicht in: | Plasma processes and polymers 2014-01, Vol.11 (1), p.7-11 |
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creator | Chen, Hsin-Liang Tu, Yen-Cheng Hsieh, Cheng-Chang Ai, Chi-Fong Tsai, Wen-Fa Leou, Keh-Chyang |
description | An innovative technique, i.e., creating a traveling wave by launching two specific standing waves at the same time, is proposed to generate uniform large‐area very high frequency (VHF) plasmas. The viability of this approach has been verified by numerical simulation in this study. The electric field distribution for each standing wave is controlled by the phase difference between the corresponding two feeding points (φ) placed on opposite sides of electrode and designated to produce a specific standing wave pattern. The simulated electric filed distributions obtained at various φ are consistent with numerous experimental works. By applying these two standing waves at the same time, a traveling wave can be lanuched as the conditions that these two standing waves must have the same amplitude and be spatially and temporally out of phase by 90° are met.
This paper proposes an innovative technique to generate uniform large‐area very high frequency (VHF) plasmas by launching two specific standing waves simultaneously. The feasibility of this technique has been successfully demonstrated using HFSS (high frequency structure simulator). The simulation results obtained with HFSS are surprisingly comparable with a 2D self‐consistent plasma model for the typical operation regime of VHF PECVD. |
doi_str_mv | 10.1002/ppap.201300101 |
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This paper proposes an innovative technique to generate uniform large‐area very high frequency (VHF) plasmas by launching two specific standing waves simultaneously. The feasibility of this technique has been successfully demonstrated using HFSS (high frequency structure simulator). The simulation results obtained with HFSS are surprisingly comparable with a 2D self‐consistent plasma model for the typical operation regime of VHF PECVD.</description><identifier>ISSN: 1612-8850</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.201300101</identifier><language>eng</language><publisher>Weinheim: Blackwell Publishing Ltd</publisher><subject>a-Si:H thin films ; Computer simulation ; electromagnetic effect ; plasma-enhanced chemical vapor deposition (PECVD) ; standing wave effect ; µc-SiH thin films</subject><ispartof>Plasma processes and polymers, 2014-01, Vol.11 (1), p.7-11</ispartof><rights>2014 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3491-89c51b5153060a951705dfc6a361db366c218df14f765ce7342f55563c192ba83</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.201300101$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.201300101$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1417,27923,27924,45573,45574</link.rule.ids></links><search><creatorcontrib>Chen, Hsin-Liang</creatorcontrib><creatorcontrib>Tu, Yen-Cheng</creatorcontrib><creatorcontrib>Hsieh, Cheng-Chang</creatorcontrib><creatorcontrib>Ai, Chi-Fong</creatorcontrib><creatorcontrib>Tsai, Wen-Fa</creatorcontrib><creatorcontrib>Leou, Keh-Chyang</creatorcontrib><title>Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave</title><title>Plasma processes and polymers</title><addtitle>Plasma Process. Polym</addtitle><description>An innovative technique, i.e., creating a traveling wave by launching two specific standing waves at the same time, is proposed to generate uniform large‐area very high frequency (VHF) plasmas. The viability of this approach has been verified by numerical simulation in this study. The electric field distribution for each standing wave is controlled by the phase difference between the corresponding two feeding points (φ) placed on opposite sides of electrode and designated to produce a specific standing wave pattern. The simulated electric filed distributions obtained at various φ are consistent with numerous experimental works. By applying these two standing waves at the same time, a traveling wave can be lanuched as the conditions that these two standing waves must have the same amplitude and be spatially and temporally out of phase by 90° are met.
This paper proposes an innovative technique to generate uniform large‐area very high frequency (VHF) plasmas by launching two specific standing waves simultaneously. The feasibility of this technique has been successfully demonstrated using HFSS (high frequency structure simulator). The simulation results obtained with HFSS are surprisingly comparable with a 2D self‐consistent plasma model for the typical operation regime of VHF PECVD.</description><subject>a-Si:H thin films</subject><subject>Computer simulation</subject><subject>electromagnetic effect</subject><subject>plasma-enhanced chemical vapor deposition (PECVD)</subject><subject>standing wave effect</subject><subject>µc-SiH thin films</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2014</creationdate><recordtype>article</recordtype><recordid>eNpdkDFPwzAQhS0EEqWwMltiYUnxxbETj6WiKaiCDC2VWCzHdUpKmgS7AfrvSVSUgene6b53enoIXQMZASH-XV2reuQToIQAgRM0AA6-F0VcnPaakXN04dyWEEpYRAboKTalsWqfVyWuMrws86yyOzxXdmO8sTUKv86mOCmU2ymH00N7aUr9npcbrPDCqi9TdHrVikt0lqnCmau_OUTL6cNiMvPmL_HjZDz3NA0EeJHQDFIGjBJOlGAQErbONFeUwzqlnGsfonUGQRZypk1IAz9jjHGqQfipiugQ3R7_1rb6bIzby13utCkKVZqqcRICEVBfQBC26M0_dFs1tmzTye7chggEbSlxpL7zwhxkbfOdsgcJRHa9yq5X2fcqk2Sc9Fvr9Y7e3O3NT-9V9kPykIZMrp5jOWNxzO_Fm3ymv1j7ejs</recordid><startdate>201401</startdate><enddate>201401</enddate><creator>Chen, Hsin-Liang</creator><creator>Tu, Yen-Cheng</creator><creator>Hsieh, Cheng-Chang</creator><creator>Ai, Chi-Fong</creator><creator>Tsai, Wen-Fa</creator><creator>Leou, Keh-Chyang</creator><general>Blackwell Publishing Ltd</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>201401</creationdate><title>Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave</title><author>Chen, Hsin-Liang ; Tu, Yen-Cheng ; Hsieh, Cheng-Chang ; Ai, Chi-Fong ; Tsai, Wen-Fa ; Leou, Keh-Chyang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3491-89c51b5153060a951705dfc6a361db366c218df14f765ce7342f55563c192ba83</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2014</creationdate><topic>a-Si:H thin films</topic><topic>Computer simulation</topic><topic>electromagnetic effect</topic><topic>plasma-enhanced chemical vapor deposition (PECVD)</topic><topic>standing wave effect</topic><topic>µc-SiH thin films</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Chen, Hsin-Liang</creatorcontrib><creatorcontrib>Tu, Yen-Cheng</creatorcontrib><creatorcontrib>Hsieh, Cheng-Chang</creatorcontrib><creatorcontrib>Ai, Chi-Fong</creatorcontrib><creatorcontrib>Tsai, Wen-Fa</creatorcontrib><creatorcontrib>Leou, Keh-Chyang</creatorcontrib><collection>Istex</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Chen, Hsin-Liang</au><au>Tu, Yen-Cheng</au><au>Hsieh, Cheng-Chang</au><au>Ai, Chi-Fong</au><au>Tsai, Wen-Fa</au><au>Leou, Keh-Chyang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Process. Polym</addtitle><date>2014-01</date><risdate>2014</risdate><volume>11</volume><issue>1</issue><spage>7</spage><epage>11</epage><pages>7-11</pages><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>An innovative technique, i.e., creating a traveling wave by launching two specific standing waves at the same time, is proposed to generate uniform large‐area very high frequency (VHF) plasmas. The viability of this approach has been verified by numerical simulation in this study. The electric field distribution for each standing wave is controlled by the phase difference between the corresponding two feeding points (φ) placed on opposite sides of electrode and designated to produce a specific standing wave pattern. The simulated electric filed distributions obtained at various φ are consistent with numerous experimental works. By applying these two standing waves at the same time, a traveling wave can be lanuched as the conditions that these two standing waves must have the same amplitude and be spatially and temporally out of phase by 90° are met.
This paper proposes an innovative technique to generate uniform large‐area very high frequency (VHF) plasmas by launching two specific standing waves simultaneously. The feasibility of this technique has been successfully demonstrated using HFSS (high frequency structure simulator). The simulation results obtained with HFSS are surprisingly comparable with a 2D self‐consistent plasma model for the typical operation regime of VHF PECVD.</abstract><cop>Weinheim</cop><pub>Blackwell Publishing Ltd</pub><doi>10.1002/ppap.201300101</doi><tpages>5</tpages></addata></record> |
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subjects | a-Si:H thin films Computer simulation electromagnetic effect plasma-enhanced chemical vapor deposition (PECVD) standing wave effect µc-SiH thin films |
title | Generation of Uniform Large-Area VHF Plasmas by Launching a Traveling Wave |
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