Magnetic nanostructures for non-volatile memories

•Two methods were used to fabricate submicron nanomagnets.•Magnets prepared by lift-off had vertical sidewalls without fencing features.•The nanomagnet mask pattern was optimized for ion-milling etch.•Angular dependence of the ground state was calculated by micromagnetic simulation.•The state of the...

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Veröffentlicht in:Microelectronic engineering 2013-10, Vol.110, p.474-478
Hauptverfasser: Šoltýs, J., Gaži, Š., Fedor, J., Tóbik, J., Precner, M., Cambel, V.
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Sprache:eng
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