Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask

Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask

In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for t...

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Veröffentlicht in:Optics express 2013-11, Vol.21 (22), p.26227-26235
Hauptverfasser: Lutkenhaus, J, George, D, Moazzezi, M, Philipose, U, Lin, Y
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creator Lutkenhaus, J
George, D
Moazzezi, M
Philipose, U
Lin, Y
description In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials.
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1458181786</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1458181786</sourcerecordid><originalsourceid>FETCH-LOGICAL-c395t-303ba2040b88bb0f5d840c3c705fae6c127dbbe43c9d68fa20fd44769d896aa33</originalsourceid><addsrcrecordid>eNpNkD1PwzAQhi0EoqWwMSOPDKT4K7EzolI-pEpdYI7OiZMYnCbEztB_T0oKYro7vY9enR6ErilZUp6I-9YsGV0SljAmT9CcklREgih5-m-foQvvPwihQqbyHM2YYDRRQs5R-WgrG8C5PQ7DDrQzuG5dW_XQ1TbHzoZ6OvZ48HZXYcC-g2DBjVlVB9y0xeAgtD0GP4Zdf8Cb5qepq8Eb3ID_vERnJThvro5zgd6f1m-rl2izfX5dPWyinKdxiDjhGhgRRCulNSnjQgmS81ySuAST5JTJQmsjeJ4WiSpHtCyEkElaqDQB4HyBbqfe8Y-vwfiQNdbnxjnYmXbwGRWxoopKlYzo3YTmfet9b8qs620D_T6jJDuYzbbrjNFsMjviN8fmQTem-IN_VfJvNvF1Xg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1458181786</pqid></control><display><type>article</type><title>Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask</title><source>DOAJ Directory of Open Access Journals</source><source>EZB-FREE-00999 freely available EZB journals</source><source>Alma/SFX Local Collection</source><creator>Lutkenhaus, J ; George, D ; Moazzezi, M ; Philipose, U ; Lin, Y</creator><creatorcontrib>Lutkenhaus, J ; George, D ; Moazzezi, M ; Philipose, U ; Lin, Y</creatorcontrib><description>In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials.</description><identifier>ISSN: 1094-4087</identifier><identifier>EISSN: 1094-4087</identifier><identifier>DOI: 10.1364/oe.21.026227</identifier><identifier>PMID: 24216847</identifier><language>eng</language><publisher>United States</publisher><ispartof>Optics express, 2013-11, Vol.21 (22), p.26227-26235</ispartof><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c395t-303ba2040b88bb0f5d840c3c705fae6c127dbbe43c9d68fa20fd44769d896aa33</citedby><cites>FETCH-LOGICAL-c395t-303ba2040b88bb0f5d840c3c705fae6c127dbbe43c9d68fa20fd44769d896aa33</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,864,27924,27925</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/24216847$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Lutkenhaus, J</creatorcontrib><creatorcontrib>George, D</creatorcontrib><creatorcontrib>Moazzezi, M</creatorcontrib><creatorcontrib>Philipose, U</creatorcontrib><creatorcontrib>Lin, Y</creatorcontrib><title>Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask</title><title>Optics express</title><addtitle>Opt Express</addtitle><description>In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials.</description><issn>1094-4087</issn><issn>1094-4087</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNpNkD1PwzAQhi0EoqWwMSOPDKT4K7EzolI-pEpdYI7OiZMYnCbEztB_T0oKYro7vY9enR6ErilZUp6I-9YsGV0SljAmT9CcklREgih5-m-foQvvPwihQqbyHM2YYDRRQs5R-WgrG8C5PQ7DDrQzuG5dW_XQ1TbHzoZ6OvZ48HZXYcC-g2DBjVlVB9y0xeAgtD0GP4Zdf8Cb5qepq8Eb3ID_vERnJThvro5zgd6f1m-rl2izfX5dPWyinKdxiDjhGhgRRCulNSnjQgmS81ySuAST5JTJQmsjeJ4WiSpHtCyEkElaqDQB4HyBbqfe8Y-vwfiQNdbnxjnYmXbwGRWxoopKlYzo3YTmfet9b8qs620D_T6jJDuYzbbrjNFsMjviN8fmQTem-IN_VfJvNvF1Xg</recordid><startdate>20131104</startdate><enddate>20131104</enddate><creator>Lutkenhaus, J</creator><creator>George, D</creator><creator>Moazzezi, M</creator><creator>Philipose, U</creator><creator>Lin, Y</creator><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7X8</scope></search><sort><creationdate>20131104</creationdate><title>Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask</title><author>Lutkenhaus, J ; George, D ; Moazzezi, M ; Philipose, U ; Lin, Y</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c395t-303ba2040b88bb0f5d840c3c705fae6c127dbbe43c9d68fa20fd44769d896aa33</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Lutkenhaus, J</creatorcontrib><creatorcontrib>George, D</creatorcontrib><creatorcontrib>Moazzezi, M</creatorcontrib><creatorcontrib>Philipose, U</creatorcontrib><creatorcontrib>Lin, Y</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>MEDLINE - Academic</collection><jtitle>Optics express</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Lutkenhaus, J</au><au>George, D</au><au>Moazzezi, M</au><au>Philipose, U</au><au>Lin, Y</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask</atitle><jtitle>Optics express</jtitle><addtitle>Opt Express</addtitle><date>2013-11-04</date><risdate>2013</risdate><volume>21</volume><issue>22</issue><spage>26227</spage><epage>26235</epage><pages>26227-26235</pages><issn>1094-4087</issn><eissn>1094-4087</eissn><abstract>In this paper, we study tunable holographic lithography using an electrically addressable spatial light modulator as a programmable phase mask. We control the phases of interfering beams diffracted from the phase pattern displayed in the spatial light modulator. We present a calculation method for the assignment of phases in the laser beams and validate the phases of the interfering beams in phase-sensitive, dual-lattice, and two-dimensional patterns formed by a rotationally non-symmetrical configuration. A good agreement has been observed between fabricated holographic structures and simulated interference patterns. The presented method can potentially help design a gradient phase mask for the fabrication of graded photonic crystals or metamaterials.</abstract><cop>United States</cop><pmid>24216847</pmid><doi>10.1364/oe.21.026227</doi><tpages>9</tpages><oa>free_for_read</oa></addata></record>
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title Digitally tunable holographic lithography using a spatial light modulator as a programmable phase mask
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-05T04%3A01%3A09IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Digitally%20tunable%20holographic%20lithography%20using%20a%20spatial%20light%20modulator%20as%20a%20programmable%20phase%20mask&rft.jtitle=Optics%20express&rft.au=Lutkenhaus,%20J&rft.date=2013-11-04&rft.volume=21&rft.issue=22&rft.spage=26227&rft.epage=26235&rft.pages=26227-26235&rft.issn=1094-4087&rft.eissn=1094-4087&rft_id=info:doi/10.1364/oe.21.026227&rft_dat=%3Cproquest_cross%3E1458181786%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1458181786&rft_id=info:pmid/24216847&rfr_iscdi=true