Preparation and properties of polycrystalline silicon seed layers on graphite substrate
Polycrystalline silicon(poly-Si) seed layers were fabricated on graphite substrates by magnetron sputtering. It was found that the substrate temperature in the process of magnetron sputtering had an important effect on the crystalline quality,and 700℃was the critical temperature in the formation of...
Gespeichert in:
Veröffentlicht in: | Journal of semiconductors 2012-11, Vol.33 (11), p.28-31 |
---|---|
1. Verfasser: | |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!