Synthesis of periodic plasmonic microstructures with copper nanoparticles in silica glass by low-energy ion implantation

Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5×10 16  ions/cm 2 and current density of 5 μA/cm...

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Veröffentlicht in:Applied physics. A, Materials science & processing Materials science & processing, 2013-04, Vol.111 (1), p.261-264
Hauptverfasser: Stepanov, A. L., Galyautdinov, M. F., Evlyukhin, A. B., Nuzhdin, V. I., Valeev, V. F., Osin, Y. N., Evlyukhin, E. A., Kiyan, R., Kavetskyy, T. S., Chichkov, B. N.
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Sprache:eng
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Zusammenfassung:Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5×10 16  ions/cm 2 and current density of 5 μA/cm 2 . This procedure involves low-energy ion implantation into the glass through a mask placed at the surface. Formation of nanoparticles was observed by optical spectroscopy and atomic force microscopy. The presented results clearly demonstrate how the low-energy ions can be used for the fabrication of photonic microstructures on dielectric surfaces in a single-step process.
ISSN:0947-8396
1432-0630
DOI:10.1007/s00339-012-7474-5