Synthesis of periodic plasmonic microstructures with copper nanoparticles in silica glass by low-energy ion implantation
Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5×10 16 ions/cm 2 and current density of 5 μA/cm...
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Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2013-04, Vol.111 (1), p.261-264 |
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Hauptverfasser: | , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Online-Zugang: | Volltext |
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Zusammenfassung: | Ion implantation was used to locally modify the surface of silica glass to create periodic plasmonic microstructures with Cu nanoparticles. Nanoparticles were synthesized by Cu-ion irradiation of the silica glass at the ion energy of 40 keV, dose of 5×10
16
ions/cm
2
and current density of 5 μA/cm
2
. This procedure involves low-energy ion implantation into the glass through a mask placed at the surface. Formation of nanoparticles was observed by optical spectroscopy and atomic force microscopy. The presented results clearly demonstrate how the low-energy ions can be used for the fabrication of photonic microstructures on dielectric surfaces in a single-step process. |
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ISSN: | 0947-8396 1432-0630 |
DOI: | 10.1007/s00339-012-7474-5 |