A universal value of effective annealing time for rapid oxide nucleation and growth under pulsed ultraviolet laser irradiation

The effective annealing times (t(eff)) for nucleating various oxides from an amorphous matrix under nanosecond pulsed laser irradiation have been determined. The oxides, which had perovskite, bixbyite, anatase, and pyrochlore structures, showed similar t(eff) values for crystal nucleation of around...

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Veröffentlicht in:Physical chemistry chemical physics : PCCP 2013-09, Vol.15 (34), p.14384-14389
Hauptverfasser: NAKAJIMA, Tomohiko, SHINODA, Kentaro, TSUCHIYA, Tetsuo
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creator NAKAJIMA, Tomohiko
SHINODA, Kentaro
TSUCHIYA, Tetsuo
description The effective annealing times (t(eff)) for nucleating various oxides from an amorphous matrix under nanosecond pulsed laser irradiation have been determined. The oxides, which had perovskite, bixbyite, anatase, and pyrochlore structures, showed similar t(eff) values for crystal nucleation of around 60 ns. This indicates that the effective annealing time is a good universal value for evaluating pulsed laser-induced oxide nucleation. Time-resolved resistance measurements of tin-doped In2O3 thin films under pulsed laser irradiation showed that crystal nucleation and rapid growth proceeded spontaneously with an instantaneous temperature rise.
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source Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection
subjects Anatase
Annealing
Chemistry
Exact sciences and technology
General and physical chemistry
Irradiation
Nanocomposites
Nanostructure
Nucleation
Oxides
Pulsed lasers
title A universal value of effective annealing time for rapid oxide nucleation and growth under pulsed ultraviolet laser irradiation
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