Exploration of Plasma-Enhanced Chemical Vapor Deposition as a Method for Thin-Film Fabrication with Biological Applications

Chemical vapor deposition (CVD) has been used historically for the fabrication of thin films composed of inorganic materials. But the advent of specialized techniques such as plasma-enhanced chemical vapor deposition (PECVD) has extended this deposition technique to various monomers. More specifical...

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Veröffentlicht in:ACS applied materials & interfaces 2013-05, Vol.5 (10), p.3983-3994
Hauptverfasser: Vasudev, Milana C, Anderson, Kyle D, Bunning, Timothy J, Tsukruk, Vladimir V, Naik, Rajesh R
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Sprache:eng
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