Effect of different calcination temperatures and post annealing on the properties of 1,3 propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) thin films
► Beneficial effect of post annealing treatment on diol based NKN film was shown. ► Single phase, pore and crack free films were fabricated. ► Effect of a post annealing step on the ferroelectric properties was shown. ► Films with high Ec and high Pr were fabricated with post annealing treatment. ►...
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| Veröffentlicht in: | Journal of alloys and compounds 2013-01, Vol.548, p.38-45 |
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| creator | Wiegand, Sebastian Flege, Stefan Baake, Olaf Ensinger, Wolfgang |
| description | ► Beneficial effect of post annealing treatment on diol based NKN film was shown. ► Single phase, pore and crack free films were fabricated. ► Effect of a post annealing step on the ferroelectric properties was shown. ► Films with high Ec and high Pr were fabricated with post annealing treatment. ► Low leakage currents were achieved with post annealing treatment.
1,3 Propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) lead-free thin films were synthesized on Pt/Ti/SiO2/Si substrates. Na-acetate, K-acetate, and Nb-pentaethoxide were used as metal precursors and 1,3 propanediol as solvent. The influence of different calcination temperatures on the properties of the NKN thin films was analysed by SEM pictures, XRD, hysteresis and leakage current measurements. Low calcination temperatures led to low leakage currents over the whole electric field range. Based on these findings a calcination at low temperatures was combined with a post annealing step. In this way low leakage currents of 6×10−5A/cm2 at an electric field of 150kV/cm and 2 Pr and 2 Ec values of 26.6μC/cm2 and 214kV/cm, respectively, could be achieved. All films with post annealing treatment were free of pore and crack formation on the surface and crystallized in the single perovskite phase of NKN. |
| doi_str_mv | 10.1016/j.jallcom.2012.08.099 |
| format | Article |
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1,3 Propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) lead-free thin films were synthesized on Pt/Ti/SiO2/Si substrates. Na-acetate, K-acetate, and Nb-pentaethoxide were used as metal precursors and 1,3 propanediol as solvent. The influence of different calcination temperatures on the properties of the NKN thin films was analysed by SEM pictures, XRD, hysteresis and leakage current measurements. Low calcination temperatures led to low leakage currents over the whole electric field range. Based on these findings a calcination at low temperatures was combined with a post annealing step. In this way low leakage currents of 6×10−5A/cm2 at an electric field of 150kV/cm and 2 Pr and 2 Ec values of 26.6μC/cm2 and 214kV/cm, respectively, could be achieved. All films with post annealing treatment were free of pore and crack formation on the surface and crystallized in the single perovskite phase of NKN.</description><identifier>ISSN: 0925-8388</identifier><identifier>EISSN: 1873-4669</identifier><identifier>DOI: 10.1016/j.jallcom.2012.08.099</identifier><language>eng</language><publisher>Kidlington: Elsevier B.V</publisher><subject>Alloys ; Annealing ; Applied sciences ; Calcination ; Ceramics ; Condensed matter: structure, mechanical and thermal properties ; Cracks ; Electric fields ; Electronics ; Exact sciences and technology ; Ferroelectrics ; Leakage current ; Mechanical and acoustical properties ; Optoelectronic devices ; Other nonelectronic physical properties ; Physical properties of thin films, nonelectronic ; Physics ; Scanning electron microscopy ; SEM ; Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices ; Sol–Gel processes ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Thin film ; Thin films ; Titanium ; X-ray diffraction</subject><ispartof>Journal of alloys and compounds, 2013-01, Vol.548, p.38-45</ispartof><rights>2012 Elsevier B.V.</rights><rights>2014 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c372t-c2d83dd00a0ee4927ee5f2c5a83a1b8160f8ea73974913e8e67c03a14223d90b3</citedby><cites>FETCH-LOGICAL-c372t-c2d83dd00a0ee4927ee5f2c5a83a1b8160f8ea73974913e8e67c03a14223d90b3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.jallcom.2012.08.099$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=26726975$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Wiegand, Sebastian</creatorcontrib><creatorcontrib>Flege, Stefan</creatorcontrib><creatorcontrib>Baake, Olaf</creatorcontrib><creatorcontrib>Ensinger, Wolfgang</creatorcontrib><title>Effect of different calcination temperatures and post annealing on the properties of 1,3 propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) thin films</title><title>Journal of alloys and compounds</title><description>► Beneficial effect of post annealing treatment on diol based NKN film was shown. ► Single phase, pore and crack free films were fabricated. ► Effect of a post annealing step on the ferroelectric properties was shown. ► Films with high Ec and high Pr were fabricated with post annealing treatment. ► Low leakage currents were achieved with post annealing treatment.
1,3 Propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) lead-free thin films were synthesized on Pt/Ti/SiO2/Si substrates. Na-acetate, K-acetate, and Nb-pentaethoxide were used as metal precursors and 1,3 propanediol as solvent. The influence of different calcination temperatures on the properties of the NKN thin films was analysed by SEM pictures, XRD, hysteresis and leakage current measurements. Low calcination temperatures led to low leakage currents over the whole electric field range. Based on these findings a calcination at low temperatures was combined with a post annealing step. In this way low leakage currents of 6×10−5A/cm2 at an electric field of 150kV/cm and 2 Pr and 2 Ec values of 26.6μC/cm2 and 214kV/cm, respectively, could be achieved. All films with post annealing treatment were free of pore and crack formation on the surface and crystallized in the single perovskite phase of NKN.</description><subject>Alloys</subject><subject>Annealing</subject><subject>Applied sciences</subject><subject>Calcination</subject><subject>Ceramics</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cracks</subject><subject>Electric fields</subject><subject>Electronics</subject><subject>Exact sciences and technology</subject><subject>Ferroelectrics</subject><subject>Leakage current</subject><subject>Mechanical and acoustical properties</subject><subject>Optoelectronic devices</subject><subject>Other nonelectronic physical properties</subject><subject>Physical properties of thin films, nonelectronic</subject><subject>Physics</subject><subject>Scanning electron microscopy</subject><subject>SEM</subject><subject>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</subject><subject>Sol–Gel processes</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Thin film</subject><subject>Thin films</subject><subject>Titanium</subject><subject>X-ray diffraction</subject><issn>0925-8388</issn><issn>1873-4669</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2013</creationdate><recordtype>article</recordtype><recordid>eNqFkc2KFDEQx4MoOI4-gpCLsAt2m4_-SE4iy7rKLrMH9Rwy6WrNkE7GJCN48x3EF_RJrHEGrx5CKsmv_lWpPyHPOWs548OrXbuzIbi0tIJx0TLVMq0fkBVXo2y6YdAPyYpp0TdKKvWYPCllxxjjWvIV-XU9z-AqTTOdPIYZYqXOBuejrT5FWmHZQ7b1kKFQGye6T6ViEMEGHz_TI_IF6D4nxKpHCKX4S_n3xkaYfAp0awtM9EMKv3_8vIFALzaWtf0trsvN9l7i-XZziTo-0tmHpTwlj2YbCjw772vy6e31x6t3zd39zfurN3eNk6OojROTktPEmGUAnRYjQD8L11slLd8qPrBZgR2lHjvNJSgYRsfwqRNCTppt5ZpcnHSx2a8HKNUsvjgIARtPh2K47HQ39lJJRPsT6nIqJcNs9tkvNn83nJmjDWZnzjaYow2GKYM2YN6LcwlbcK5zttH58i9ZDKMYNJZYk9cnDvC_3zxkU5yH6HCAGQ0yU_L_qfQHLNegvA</recordid><startdate>20130125</startdate><enddate>20130125</enddate><creator>Wiegand, Sebastian</creator><creator>Flege, Stefan</creator><creator>Baake, Olaf</creator><creator>Ensinger, Wolfgang</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20130125</creationdate><title>Effect of different calcination temperatures and post annealing on the properties of 1,3 propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) thin films</title><author>Wiegand, Sebastian ; Flege, Stefan ; Baake, Olaf ; Ensinger, Wolfgang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c372t-c2d83dd00a0ee4927ee5f2c5a83a1b8160f8ea73974913e8e67c03a14223d90b3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2013</creationdate><topic>Alloys</topic><topic>Annealing</topic><topic>Applied sciences</topic><topic>Calcination</topic><topic>Ceramics</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cracks</topic><topic>Electric fields</topic><topic>Electronics</topic><topic>Exact sciences and technology</topic><topic>Ferroelectrics</topic><topic>Leakage current</topic><topic>Mechanical and acoustical properties</topic><topic>Optoelectronic devices</topic><topic>Other nonelectronic physical properties</topic><topic>Physical properties of thin films, nonelectronic</topic><topic>Physics</topic><topic>Scanning electron microscopy</topic><topic>SEM</topic><topic>Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices</topic><topic>Sol–Gel processes</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Thin film</topic><topic>Thin films</topic><topic>Titanium</topic><topic>X-ray diffraction</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Wiegand, Sebastian</creatorcontrib><creatorcontrib>Flege, Stefan</creatorcontrib><creatorcontrib>Baake, Olaf</creatorcontrib><creatorcontrib>Ensinger, Wolfgang</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of alloys and compounds</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Wiegand, Sebastian</au><au>Flege, Stefan</au><au>Baake, Olaf</au><au>Ensinger, Wolfgang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effect of different calcination temperatures and post annealing on the properties of 1,3 propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) thin films</atitle><jtitle>Journal of alloys and compounds</jtitle><date>2013-01-25</date><risdate>2013</risdate><volume>548</volume><spage>38</spage><epage>45</epage><pages>38-45</pages><issn>0925-8388</issn><eissn>1873-4669</eissn><abstract>► Beneficial effect of post annealing treatment on diol based NKN film was shown. ► Single phase, pore and crack free films were fabricated. ► Effect of a post annealing step on the ferroelectric properties was shown. ► Films with high Ec and high Pr were fabricated with post annealing treatment. ► Low leakage currents were achieved with post annealing treatment.
1,3 Propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) lead-free thin films were synthesized on Pt/Ti/SiO2/Si substrates. Na-acetate, K-acetate, and Nb-pentaethoxide were used as metal precursors and 1,3 propanediol as solvent. The influence of different calcination temperatures on the properties of the NKN thin films was analysed by SEM pictures, XRD, hysteresis and leakage current measurements. Low calcination temperatures led to low leakage currents over the whole electric field range. Based on these findings a calcination at low temperatures was combined with a post annealing step. In this way low leakage currents of 6×10−5A/cm2 at an electric field of 150kV/cm and 2 Pr and 2 Ec values of 26.6μC/cm2 and 214kV/cm, respectively, could be achieved. All films with post annealing treatment were free of pore and crack formation on the surface and crystallized in the single perovskite phase of NKN.</abstract><cop>Kidlington</cop><pub>Elsevier B.V</pub><doi>10.1016/j.jallcom.2012.08.099</doi><tpages>8</tpages></addata></record> |
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| subjects | Alloys Annealing Applied sciences Calcination Ceramics Condensed matter: structure, mechanical and thermal properties Cracks Electric fields Electronics Exact sciences and technology Ferroelectrics Leakage current Mechanical and acoustical properties Optoelectronic devices Other nonelectronic physical properties Physical properties of thin films, nonelectronic Physics Scanning electron microscopy SEM Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices Sol–Gel processes Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film Thin films Titanium X-ray diffraction |
| title | Effect of different calcination temperatures and post annealing on the properties of 1,3 propanediol based Sol–Gel (Na0.5K0.5)NbO3 (NKN) thin films |
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