Pixelated source and mask optimization for immersion lithography

Immersion lithography systems with hyper-numerical aperture (hyper-NA) (NA>1) have become indispensable in nanolithography for technology nodes of 45 nm and beyond. Source and mask optimization (SMO) has emerged as a key technique used to further improve the imaging performance of immersion litho...

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Bibliographische Detailangaben

Veröffentlicht in:	Journal of the Optical Society of America. A, Optics, image science, and vision Optics, image science, and vision, 2013-01, Vol.30 (1), p.112-123
Hauptverfasser:	Ma, Xu, Han, Chunying, Li, Yanqiu, Dong, Lisong, Arce, Gonzalo R
Format:	Artikel
Sprache:	eng
Schlagworte:	Imaging Immersion Lithography Masks Mathematical analysis Nanostructure Optimization Vectors (mathematics)
Online-Zugang:	Volltext
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