Improved grating reconstruction by determination of line roughness in extreme ultraviolet scatterometry

The accurate determination of critical dimensions and roughness is necessary to ensure the quality of photoresist masks that are crucial for the operational reliability of electronic components. Scatterometry provides a fast indirect optical nondestructive method for the determination of profile par...

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Veröffentlicht in:	Optics letters 2012-12, Vol.37 (24), p.5229-5231
Hauptverfasser:	Henn, Mark-Alexander, Heidenreich, Sebastian, Gross, Hermann, Rathsfeld, Andreas, Scholze, Frank, Bär, Markus
Format:	Artikel
Sprache:	eng
Schlagworte:	Diffraction gratings Gratings (spectra) Inverse method Mathematical analysis Mathematical models Reconstruction Roughness Ultraviolet
Online-Zugang:	Volltext
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