Low-flow-resistance Methacrylate-based Polymer Monolithic Column Prepared by Low-conversion Ultraviolet Photopolymerization at Low Temperature

A low-conversion poly(butyl methacrylate-co-ethylene dimethacrylate)-based polymer monolithic column was prepared by ultraviolet (UV) irradiation for a short time at a low temperature (–15°C). By UV irradiation for 2 min, the monolithic column exhibited a high permeability of 5.6 × 10−13 m2 and a hi...

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Veröffentlicht in:Analytical Sciences 2013/02/10, Vol.29(2), pp.205-211
Hauptverfasser: HIRANO, Tomohiko, KOBAYASHI, Ayumi, NAKAZA, Takuya, KITAGAWA, Shinya, OHTANI, Hajime, NAGAYAMA, Kazuaki, MATSUMOTO, Takeo
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Sprache:eng
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