High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser

A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Veröffentlicht in:	Applied physics. B, Lasers and optics Lasers and optics, 2003-03, Vol.76 (3), p.277-284
Hauptverfasser:	BOLLANTI, S, BONFIGLI, F, MURRA, D, ZHENG, C, BURATTINI, E, DI LAZZARO, P, FLORA, F, GRILLI, A, LETARDI, T, LISI, N, MARINAI, A, MEZI, L
Format:	Artikel
Sprache:	eng
Schlagworte:	Cleaning Clusters Debris Exact sciences and technology Excimer lasers Instruments, apparatus, components and techniques common to several branches of physics and astronomy Irradiation Laser-plasma interactions Lasers Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma (physics) Plasma production and heating Plasma production and heating by laser beams Projection X- and γ-ray instruments and techniques X- and γ-ray sources, mirrors, gratings and detectors
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Schreiben Sie den ersten Kommentar!