High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser

A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p...

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Veröffentlicht in:Applied physics. B, Lasers and optics Lasers and optics, 2003-03, Vol.76 (3), p.277-284
Hauptverfasser: BOLLANTI, S, BONFIGLI, F, MURRA, D, ZHENG, C, BURATTINI, E, DI LAZZARO, P, FLORA, F, GRILLI, A, LETARDI, T, LISI, N, MARINAI, A, MEZI, L
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container_end_page 284
container_issue 3
container_start_page 277
container_title Applied physics. B, Lasers and optics
container_volume 76
creator BOLLANTI, S
BONFIGLI, F
MURRA, D
ZHENG, C
BURATTINI, E
DI LAZZARO, P
FLORA, F
GRILLI, A
LETARDI, T
LISI, N
MARINAI, A
MEZI, L
description A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. Our results show that a suitable combination of driving-laser characteristics, target material and thickness, environment gas and mechanical choppers can make clean and increase the power of EUV solid-target laser-plasma sources.
doi_str_mv 10.1007/s00340-002-1088-0
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The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. 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subjects Cleaning
Clusters
Debris
Exact sciences and technology
Excimer lasers
Instruments, apparatus, components and techniques common to several branches of physics and astronomy
Irradiation
Laser-plasma interactions
Lasers
Physics
Physics of gases, plasmas and electric discharges
Physics of plasmas and electric discharges
Plasma (physics)
Plasma production and heating
Plasma production and heating by laser beams
Projection
X- and γ-ray instruments and techniques
X- and γ-ray sources, mirrors, gratings and detectors
title High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser
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