High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser
A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p...
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Veröffentlicht in: | Applied physics. B, Lasers and optics Lasers and optics, 2003-03, Vol.76 (3), p.277-284 |
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container_title | Applied physics. B, Lasers and optics |
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creator | BOLLANTI, S BONFIGLI, F MURRA, D ZHENG, C BURATTINI, E DI LAZZARO, P FLORA, F GRILLI, A LETARDI, T LISI, N MARINAI, A MEZI, L |
description | A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. Our results show that a suitable combination of driving-laser characteristics, target material and thickness, environment gas and mechanical choppers can make clean and increase the power of EUV solid-target laser-plasma sources. |
doi_str_mv | 10.1007/s00340-002-1088-0 |
format | Article |
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The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. Our results show that a suitable combination of driving-laser characteristics, target material and thickness, environment gas and mechanical choppers can make clean and increase the power of EUV solid-target laser-plasma sources.</description><identifier>ISSN: 0946-2171</identifier><identifier>EISSN: 1432-0649</identifier><identifier>DOI: 10.1007/s00340-002-1088-0</identifier><language>eng</language><publisher>Berlin: Springer</publisher><subject>Cleaning ; Clusters ; Debris ; Exact sciences and technology ; Excimer lasers ; Instruments, apparatus, components and techniques common to several branches of physics and astronomy ; Irradiation ; Laser-plasma interactions ; Lasers ; Physics ; Physics of gases, plasmas and electric discharges ; Physics of plasmas and electric discharges ; Plasma (physics) ; Plasma production and heating ; Plasma production and heating by laser beams ; Projection ; X- and γ-ray instruments and techniques ; X- and γ-ray sources, mirrors, gratings and detectors</subject><ispartof>Applied physics. 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B, Lasers and optics</title><description>A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. Our results show that a suitable combination of driving-laser characteristics, target material and thickness, environment gas and mechanical choppers can make clean and increase the power of EUV solid-target laser-plasma sources.</description><subject>Cleaning</subject><subject>Clusters</subject><subject>Debris</subject><subject>Exact sciences and technology</subject><subject>Excimer lasers</subject><subject>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</subject><subject>Irradiation</subject><subject>Laser-plasma interactions</subject><subject>Lasers</subject><subject>Physics</subject><subject>Physics of gases, plasmas and electric discharges</subject><subject>Physics of plasmas and electric discharges</subject><subject>Plasma (physics)</subject><subject>Plasma production and heating</subject><subject>Plasma production and heating by laser beams</subject><subject>Projection</subject><subject>X- and γ-ray instruments and techniques</subject><subject>X- and γ-ray sources, mirrors, gratings and detectors</subject><issn>0946-2171</issn><issn>1432-0649</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNpFkMtOwzAQRS0EEuXxAey8QWKBYWwncbJEVaFIldhQttbEsVujvLAToH9PqlZiNrOYe65Gh5AbDg8cQD1GAJkAAxCMQ54zOCEznkjBIEuKUzKDIsmY4Iqfk4sYP2GaLM9nRC_9Zsusc95425odNbXFli7WH7SvMTZIYzcGYykOlAOTQNvmnlbBf9uWljuKtO7aDevHOlr246thS-2v8Y0NdMJtuCJnDqfb9XFfkvXz4n2-ZKu3l9f504oZIfjAVKqcLNJCWZGlqCROz6nMoqlKBGFNWVXI07KopFIJOsldkaYqqVJlKuBSyEtyd-jtQ_c12jjoxkdj6xpb241Rc5HLrBBZLqcoP0RN6GIM1uk--AbDTnPQe5n6IFNPMvVepoaJuT3WYzRYu4Ct8fEfTFQCmQD5B9zccqc</recordid><startdate>200303</startdate><enddate>200303</enddate><creator>BOLLANTI, S</creator><creator>BONFIGLI, F</creator><creator>MURRA, D</creator><creator>ZHENG, C</creator><creator>BURATTINI, E</creator><creator>DI LAZZARO, P</creator><creator>FLORA, F</creator><creator>GRILLI, A</creator><creator>LETARDI, T</creator><creator>LISI, N</creator><creator>MARINAI, A</creator><creator>MEZI, L</creator><general>Springer</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope></search><sort><creationdate>200303</creationdate><title>High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser</title><author>BOLLANTI, S ; BONFIGLI, F ; MURRA, D ; ZHENG, C ; BURATTINI, E ; DI LAZZARO, P ; FLORA, F ; GRILLI, A ; LETARDI, T ; LISI, N ; MARINAI, A ; MEZI, L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c221t-757f39597e265a73a68876eacdba02ecbdda15b9d3774af31f95574d57cd01323</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Cleaning</topic><topic>Clusters</topic><topic>Debris</topic><topic>Exact sciences and technology</topic><topic>Excimer lasers</topic><topic>Instruments, apparatus, components and techniques common to several branches of physics and astronomy</topic><topic>Irradiation</topic><topic>Laser-plasma interactions</topic><topic>Lasers</topic><topic>Physics</topic><topic>Physics of gases, plasmas and electric discharges</topic><topic>Physics of plasmas and electric discharges</topic><topic>Plasma (physics)</topic><topic>Plasma production and heating</topic><topic>Plasma production and heating by laser beams</topic><topic>Projection</topic><topic>X- and γ-ray instruments and techniques</topic><topic>X- and γ-ray sources, mirrors, gratings and detectors</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>BOLLANTI, S</creatorcontrib><creatorcontrib>BONFIGLI, F</creatorcontrib><creatorcontrib>MURRA, D</creatorcontrib><creatorcontrib>ZHENG, C</creatorcontrib><creatorcontrib>BURATTINI, E</creatorcontrib><creatorcontrib>DI LAZZARO, P</creatorcontrib><creatorcontrib>FLORA, F</creatorcontrib><creatorcontrib>GRILLI, A</creatorcontrib><creatorcontrib>LETARDI, T</creatorcontrib><creatorcontrib>LISI, N</creatorcontrib><creatorcontrib>MARINAI, A</creatorcontrib><creatorcontrib>MEZI, L</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics. B, Lasers and optics</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>BOLLANTI, S</au><au>BONFIGLI, F</au><au>MURRA, D</au><au>ZHENG, C</au><au>BURATTINI, E</au><au>DI LAZZARO, P</au><au>FLORA, F</au><au>GRILLI, A</au><au>LETARDI, T</au><au>LISI, N</au><au>MARINAI, A</au><au>MEZI, L</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser</atitle><jtitle>Applied physics. B, Lasers and optics</jtitle><date>2003-03</date><risdate>2003</risdate><volume>76</volume><issue>3</issue><spage>277</spage><epage>284</epage><pages>277-284</pages><issn>0946-2171</issn><eissn>1432-0649</eissn><abstract>A long-pulse-width high-output energy (120 ns FWHM, 7 J) XeCl laser has been focused on thin tape targets (Cu and Ta) to generate more than 100-ns-long (FWHM) EUV pulses in the 10--30 nm spectral region, suitable for projection microlithography. The conversion efficiency was more than 20% over a 2*p solid angle. We observed debris emission using a gated CCD camera, and measured the debris speed for different irradiation conditions. We found irradiation conditions such that the measured velocities were low enough that simple mechanical devices combined with krypton at low-pressure could efficiently stop both ionic debris and cluster debris. Our results show that a suitable combination of driving-laser characteristics, target material and thickness, environment gas and mechanical choppers can make clean and increase the power of EUV solid-target laser-plasma sources.</abstract><cop>Berlin</cop><pub>Springer</pub><doi>10.1007/s00340-002-1088-0</doi><tpages>8</tpages></addata></record> |
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subjects | Cleaning Clusters Debris Exact sciences and technology Excimer lasers Instruments, apparatus, components and techniques common to several branches of physics and astronomy Irradiation Laser-plasma interactions Lasers Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma (physics) Plasma production and heating Plasma production and heating by laser beams Projection X- and γ-ray instruments and techniques X- and γ-ray sources, mirrors, gratings and detectors |
title | High-efficiency clean EUV plasma source at 10-30 nm, driven by a long-pulse-width excimer laser |
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