Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets
The interaction of high intensity 100-ps laser pulses with micron-sized noble gas (argon and krypton) droplets is experimentally investigated via a series of pump--probe experiments monitoring the delay-dependent X-ray and extreme ultraviolet (EUV) emission, and by imaging frequency-doubled probe li...
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| Veröffentlicht in: | Applied physics. A, Materials science & processing Materials science & processing, 2003-07, Vol.77 (2), p.317-323 |
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| container_title | Applied physics. A, Materials science & processing |
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| creator | Parra, E. McNaught, S.J. Fan, J. Milchberg, H.M. |
| description | The interaction of high intensity 100-ps laser pulses with micron-sized noble gas (argon and krypton) droplets is experimentally investigated via a series of pump--probe experiments monitoring the delay-dependent X-ray and extreme ultraviolet (EUV) emission, and by imaging frequency-doubled probe light scattered from the interaction region. An understanding of the time scales for this interaction is important for optimization of EUV sources for next-generation lithography that utilizes laser-produced plasmas (LPP). Depending on the spectral region of interest, the type of emission, and the droplet characteristics, the effective emission lifetime was found to extend from a few hundred picoseconds to as long as several nanoseconds, in agreement with the expected plasma expansion, EUV excitation, and recombination emission time scales. |
| doi_str_mv | 10.1007/s00339-003-2140-6 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1283675004</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>1283675004</sourcerecordid><originalsourceid>FETCH-LOGICAL-c342t-9aba458c0192231535ca46787d443ad8676ce0191138766797cf72ee7f84c47a3</originalsourceid><addsrcrecordid>eNotkLtOAzEQRS0EEiHwAXQuaQx-rb1boig8JCQoCKLCmtizaNE-gr1bpOMf-EO-BIcwxZ3iHo3mXkLOBb8UnNurxLlSFcvKpNCcmQMyE1pJxo3ih2TGK21ZqSpzTE5S-uB5tJQz8vY0dZufr-9NHNZI0ziFBhMdarpcvVDoA31lEbYUuyalZuhp2PbQNf4PaSFhZE2MEBoYMdB-WLdI3yHREIdNi2M6JUc1tAnP_vecrG6Wz4s79vB4e7-4fmBeaTmyCtagi9JzUUmpRKEKD9rY0gatFYTSWOMxm0Ko0hpjK-trKxFtXWqvLag5udjfzTk-J0yjyw97bFvocZiSE7JUxhY5dEbFHvVxSCli7Tax6SBuneBu16Xbd-myul2Xzqhfn_dnMg</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1283675004</pqid></control><display><type>article</type><title>Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets</title><source>SpringerLink (Online service)</source><creator>Parra, E. ; McNaught, S.J. ; Fan, J. ; Milchberg, H.M.</creator><creatorcontrib>Parra, E. ; McNaught, S.J. ; Fan, J. ; Milchberg, H.M.</creatorcontrib><description>The interaction of high intensity 100-ps laser pulses with micron-sized noble gas (argon and krypton) droplets is experimentally investigated via a series of pump--probe experiments monitoring the delay-dependent X-ray and extreme ultraviolet (EUV) emission, and by imaging frequency-doubled probe light scattered from the interaction region. An understanding of the time scales for this interaction is important for optimization of EUV sources for next-generation lithography that utilizes laser-produced plasmas (LPP). Depending on the spectral region of interest, the type of emission, and the droplet characteristics, the effective emission lifetime was found to extend from a few hundred picoseconds to as long as several nanoseconds, in agreement with the expected plasma expansion, EUV excitation, and recombination emission time scales.</description><identifier>ISSN: 0947-8396</identifier><identifier>EISSN: 1432-0630</identifier><identifier>DOI: 10.1007/s00339-003-2140-6</identifier><language>eng</language><subject>Droplets ; Emission ; Emission analysis ; Lithography ; Nanostructure ; Plasmas ; Ultraviolet ; X-rays</subject><ispartof>Applied physics. A, Materials science & processing, 2003-07, Vol.77 (2), p.317-323</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c342t-9aba458c0192231535ca46787d443ad8676ce0191138766797cf72ee7f84c47a3</citedby></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids></links><search><creatorcontrib>Parra, E.</creatorcontrib><creatorcontrib>McNaught, S.J.</creatorcontrib><creatorcontrib>Fan, J.</creatorcontrib><creatorcontrib>Milchberg, H.M.</creatorcontrib><title>Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets</title><title>Applied physics. A, Materials science & processing</title><description>The interaction of high intensity 100-ps laser pulses with micron-sized noble gas (argon and krypton) droplets is experimentally investigated via a series of pump--probe experiments monitoring the delay-dependent X-ray and extreme ultraviolet (EUV) emission, and by imaging frequency-doubled probe light scattered from the interaction region. An understanding of the time scales for this interaction is important for optimization of EUV sources for next-generation lithography that utilizes laser-produced plasmas (LPP). Depending on the spectral region of interest, the type of emission, and the droplet characteristics, the effective emission lifetime was found to extend from a few hundred picoseconds to as long as several nanoseconds, in agreement with the expected plasma expansion, EUV excitation, and recombination emission time scales.</description><subject>Droplets</subject><subject>Emission</subject><subject>Emission analysis</subject><subject>Lithography</subject><subject>Nanostructure</subject><subject>Plasmas</subject><subject>Ultraviolet</subject><subject>X-rays</subject><issn>0947-8396</issn><issn>1432-0630</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2003</creationdate><recordtype>article</recordtype><recordid>eNotkLtOAzEQRS0EEiHwAXQuaQx-rb1boig8JCQoCKLCmtizaNE-gr1bpOMf-EO-BIcwxZ3iHo3mXkLOBb8UnNurxLlSFcvKpNCcmQMyE1pJxo3ih2TGK21ZqSpzTE5S-uB5tJQz8vY0dZufr-9NHNZI0ziFBhMdarpcvVDoA31lEbYUuyalZuhp2PbQNf4PaSFhZE2MEBoYMdB-WLdI3yHREIdNi2M6JUc1tAnP_vecrG6Wz4s79vB4e7-4fmBeaTmyCtagi9JzUUmpRKEKD9rY0gatFYTSWOMxm0Ko0hpjK-trKxFtXWqvLag5udjfzTk-J0yjyw97bFvocZiSE7JUxhY5dEbFHvVxSCli7Tax6SBuneBu16Xbd-myul2Xzqhfn_dnMg</recordid><startdate>20030701</startdate><enddate>20030701</enddate><creator>Parra, E.</creator><creator>McNaught, S.J.</creator><creator>Fan, J.</creator><creator>Milchberg, H.M.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8D</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20030701</creationdate><title>Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets</title><author>Parra, E. ; McNaught, S.J. ; Fan, J. ; Milchberg, H.M.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c342t-9aba458c0192231535ca46787d443ad8676ce0191138766797cf72ee7f84c47a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2003</creationdate><topic>Droplets</topic><topic>Emission</topic><topic>Emission analysis</topic><topic>Lithography</topic><topic>Nanostructure</topic><topic>Plasmas</topic><topic>Ultraviolet</topic><topic>X-rays</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Parra, E.</creatorcontrib><creatorcontrib>McNaught, S.J.</creatorcontrib><creatorcontrib>Fan, J.</creatorcontrib><creatorcontrib>Milchberg, H.M.</creatorcontrib><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied physics. A, Materials science & processing</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Parra, E.</au><au>McNaught, S.J.</au><au>Fan, J.</au><au>Milchberg, H.M.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets</atitle><jtitle>Applied physics. A, Materials science & processing</jtitle><date>2003-07-01</date><risdate>2003</risdate><volume>77</volume><issue>2</issue><spage>317</spage><epage>323</epage><pages>317-323</pages><issn>0947-8396</issn><eissn>1432-0630</eissn><abstract>The interaction of high intensity 100-ps laser pulses with micron-sized noble gas (argon and krypton) droplets is experimentally investigated via a series of pump--probe experiments monitoring the delay-dependent X-ray and extreme ultraviolet (EUV) emission, and by imaging frequency-doubled probe light scattered from the interaction region. An understanding of the time scales for this interaction is important for optimization of EUV sources for next-generation lithography that utilizes laser-produced plasmas (LPP). Depending on the spectral region of interest, the type of emission, and the droplet characteristics, the effective emission lifetime was found to extend from a few hundred picoseconds to as long as several nanoseconds, in agreement with the expected plasma expansion, EUV excitation, and recombination emission time scales.</abstract><doi>10.1007/s00339-003-2140-6</doi><tpages>7</tpages></addata></record> |
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| ispartof | Applied physics. A, Materials science & processing, 2003-07, Vol.77 (2), p.317-323 |
| issn | 0947-8396 1432-0630 |
| language | eng |
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| source | SpringerLink (Online service) |
| subjects | Droplets Emission Emission analysis Lithography Nanostructure Plasmas Ultraviolet X-rays |
| title | Pump–probe studies of EUV and X-ray emission dynamics of laser-irradiated noble gas droplets |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-20T19%3A00%3A29IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Pump%E2%80%93probe%20studies%20of%20EUV%20and%20X-ray%20emission%20dynamics%20of%20laser-irradiated%20noble%20gas%20droplets&rft.jtitle=Applied%20physics.%20A,%20Materials%20science%20&%20processing&rft.au=Parra,%20E.&rft.date=2003-07-01&rft.volume=77&rft.issue=2&rft.spage=317&rft.epage=323&rft.pages=317-323&rft.issn=0947-8396&rft.eissn=1432-0630&rft_id=info:doi/10.1007/s00339-003-2140-6&rft_dat=%3Cproquest_cross%3E1283675004%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1283675004&rft_id=info:pmid/&rfr_iscdi=true |