Solution-based adaptive parallel patterning by laser-induced local plasmonic surface defunctionalization
Adaptive mass fabrication method based on laser-induced plasmonic local surface defunctionalization was suggested to realize solution-based high resolution self-patterning on transparent substrate in parallel. After non-patterned functional monolayer was locally deactivated by laser-induced metallic...
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Veröffentlicht in: | Optics express 2012-12, Vol.20 (27), p.29111-29120 |
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Sprache: | eng |
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