Electrooptical Characterization of MWIR InAsSb Detectors
InAs 1− x Sb x material with an alloy composition of the absorber layer adjusted to achieve 200-K cutoff wavelengths in the 5- μ m range has been grown. Compound-barrier (CB) detectors were fabricated and tested for optical response, and J dark – V d measurements were taken as a function of temperat...
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Veröffentlicht in: | Journal of electronic materials 2012-10, Vol.41 (10), p.2671-2678 |
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Hauptverfasser: | , , , , , , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
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Zusammenfassung: | InAs
1−
x
Sb
x
material with an alloy composition of the absorber layer adjusted to achieve 200-K cutoff wavelengths in the 5-
μ
m range has been grown. Compound-barrier (CB) detectors were fabricated and tested for optical response, and
J
dark
–
V
d
measurements were taken as a function of temperature. Based on absorption coefficient information in the literature and spectral response measurements of the midwave infrared (MWIR) nCBn detectors, an absorption coefficient formula
α
(
Ε
,
x
,
T
) is proposed. Since the presently suggested absorption coefficient is based on limited data, additional measurements of material and detectors with different
x
values and as a function of temperature should refine the absorption coefficient, providing more accurate parametrization. Material electronic structures were computed using a
k
·
p
formalism. From the band structure, dark-current density (
J
dark
) as a function of bias (
V
d
) and temperature (
T
) was calculated and matched to
J
dark
–
V
d
curves at fixed
T
and
J
dark
–
T
curves at constant
V
d
. There is a good match between simulation and data over a wide range of bias, but discrepancies that are not presently understood exist near zero bias. |
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ISSN: | 0361-5235 1543-186X |
DOI: | 10.1007/s11664-012-2182-7 |