Block Copolymer Orientation Control Using a Top-Coat Surface Treatment
Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patte...
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| Veröffentlicht in: | Journal of Photopolymer Science and Technology 2012/06/26, Vol.25(1), pp.125-130 |
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| container_end_page | 130 |
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| container_issue | 1 |
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| container_title | Journal of Photopolymer Science and Technology |
| container_volume | 25 |
| creator | Seshimo, Takehiro Bates, Christopher M. Dean, Leon M. Cushen, Julia D. Durand, William J. Maher, Michael J. Ellison, Christopher J. Willson, C. Grant |
| description | Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block. |
| doi_str_mv | 10.2494/photopolymer.25.125 |
| format | Article |
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| ispartof | Journal of Photopolymer Science and Technology, 2012/06/26, Vol.25(1), pp.125-130 |
| issn | 0914-9244 1349-6336 |
| language | eng |
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| source | J-STAGE Free; EZB-FREE-00999 freely available EZB journals; Free Full-Text Journals in Chemistry |
| subjects | Alignment Block copolymers Blocking directed self assembly High resolution Patterning Self assembly Si-containing block copolymer Surface energy Surface treatment Top-coat |
| title | Block Copolymer Orientation Control Using a Top-Coat Surface Treatment |
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