Temperature impact on the tunnel fet off-state current components

► We study the temperature impact on the off-state current components. ► The best behavior for off-state current was obtained for higher values of underlap and at low temperatures. ► TFETs with higher values of underlap make the off-state region more temperature dependent. ► The analyzed TFETs prese...

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Veröffentlicht in:Solid-state electronics 2012-12, Vol.78, p.141-146
Hauptverfasser: Agopian, Paula Ghedini Der, Martino, Márcio Dalla Valle, Filho, Sebastião Gomes dos Santos, Martino, João Antonio, Rooyackers, Rita, Leonelli, Daniele, Claeys, Cor
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Sprache:eng
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Zusammenfassung:► We study the temperature impact on the off-state current components. ► The best behavior for off-state current was obtained for higher values of underlap and at low temperatures. ► TFETs with higher values of underlap make the off-state region more temperature dependent. ► The analyzed TFETs presented a good performance for analog applications. In this work, the temperature impact on the off-state current components is analyzed through numerical simulation and experimentally. First of all, the band-to-band tunneling is studied by varying the underlap in the channel/drain junction, leading to an analysis of the different off-state current components. For pTFET devices, the best behavior for off-state current was obtained for higher values of underlap (reduced BTBT) and at low temperatures (reduced SRH and TAT). At high temperature, an unexpected off-state current occurred due to the thermal leakage current through the drain/channel junction. Besides, these devices presented a good performance when considering the drain current as a function of the drain voltage, making them suitable for analog applications.
ISSN:0038-1101
1879-2405
DOI:10.1016/j.sse.2012.05.053