Comprehensive dielectric performance of bismuth acceptor doped BaTiO sub(3) based nanocrystal thin film capacitors

We present a novel approach to preparing bismuth acceptor doped barium titanate nanocrystal formulations that can be deposited in conjunction with polymers in order to prepare a thin film nanocomposite dielectric that exhibits desirable capacitor characteristics. Exploring the limits of dielectric f...

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Veröffentlicht in:Journal of materials chemistry 2012-10, Vol.22 (41), p.21862-21870
Hauptverfasser: Liu, Shuangyi, Zhang, Henan, Sviridov, Lev, Huang, Limin, Liu, Xiaohua, Samson, Jacopo, Akins, Dan, Li, Jackie, O'Brien, Stephen
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container_end_page 21870
container_issue 41
container_start_page 21862
container_title Journal of materials chemistry
container_volume 22
creator Liu, Shuangyi
Zhang, Henan
Sviridov, Lev
Huang, Limin
Liu, Xiaohua
Samson, Jacopo
Akins, Dan
Li, Jackie
O'Brien, Stephen
description We present a novel approach to preparing bismuth acceptor doped barium titanate nanocrystal formulations that can be deposited in conjunction with polymers in order to prepare a thin film nanocomposite dielectric that exhibits desirable capacitor characteristics. Exploring the limits of dielectric function in nanocomposites is an important avenue of materials research, while paying strict attention to the overall device quality, namely permittivity, loss and equivalent series resistance (ESR). Pushing capacitor function to higher frequencies, a desirable goal from an electrical engineering point of view, presents a new set of challenges in terms of minimizing interfacial, space charge and polarization effects within the dielectric. We show the ability to synthesize BaTi sub(0.96)Bi sub(0.04)O sub(3) or BaTi sub(0.97)Bi sub(0.03)O sub(3) depending on nominal molar concentrations of bismuth at the onset. The low temperature solvothermal route allows for substitution at the titanium site (strongly supported by Rietveld and Raman analysis). Characterization is performed by XRD with Rietveld refinement, Raman Spectroscopy, SEM and HRTEM. A mechanism is proposed for bismuth acceptor substitution, based on the chemical reaction of the alkoxy-metal precursors involving nucleophilic addition. Dielectric analysis of the nanocrystal thin films is performed by preparing nanocrystal/PVP 2-2 nanocomposites (no annealing) and comparing BaTi sub(0.96)Bi sub(0.04)O sub(3) and BaTi sub(0.97)Bi sub(0.03)O sub(3) with undoped BaTiO sub(3). Improvements of up to 25% in capacitance (permittivity) are observed, with lower loss and dramatically improved ESR, all to very high frequency ranges (>10 MHz).
doi_str_mv 10.1039/c2jm34044e
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A mechanism is proposed for bismuth acceptor substitution, based on the chemical reaction of the alkoxy-metal precursors involving nucleophilic addition. Dielectric analysis of the nanocrystal thin films is performed by preparing nanocrystal/PVP 2-2 nanocomposites (no annealing) and comparing BaTi sub(0.96)Bi sub(0.04)O sub(3) and BaTi sub(0.97)Bi sub(0.03)O sub(3) with undoped BaTiO sub(3). 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source Royal Society Of Chemistry Journals 2008-; Alma/SFX Local Collection
subjects Barium titanates
Bismuth
Capacitors
Dielectrics
Nanocrystals
Nanomaterials
Nanostructure
Thin films
title Comprehensive dielectric performance of bismuth acceptor doped BaTiO sub(3) based nanocrystal thin film capacitors
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