Illumination instabilities in ZnO/HfO2 thin-film transistors and influence of grain boundary charge

The illumination instabilities of nanocrystalline ZnO thin-film transistors (TFT) with HfO2 gate dielectrics are reported via zero gate bias multiwave length illumination stress method. TFT ID–VG curves exhibit a negative threshold voltage shift together with an increase in ID off current and increa...

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Veröffentlicht in:Journal of materials research 2012-09, Vol.27 (17), p.2199-2204
Hauptverfasser: Siddiqui, Jeffrey J., Phillips, Jamie D., Leedy, Kevin, Bayraktaroglu, Burhan
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container_issue 17
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container_title Journal of materials research
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creator Siddiqui, Jeffrey J.
Phillips, Jamie D.
Leedy, Kevin
Bayraktaroglu, Burhan
description The illumination instabilities of nanocrystalline ZnO thin-film transistors (TFT) with HfO2 gate dielectrics are reported via zero gate bias multiwave length illumination stress method. TFT ID–VG curves exhibit a negative threshold voltage shift together with an increase in ID off current and increase in subthreshold slope with increasing photon energy and illumination time. Analysis of transistor characteristics indicates that one component governing negative threshold voltage shifts is a decrease in grain boundary-trapped charge areal density due to illumination. This relationship can be explained by conduction based on thermionic emission over potential barriers formed at the ZnO crystallite boundaries. ID off-state current trends with photon energy in a manner consistent with exponentially decreasing absorption below the conduction band edge.
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subjects Analysis
Applied and Technical Physics
Biomaterials
Charge
Crystals
Dielectrics
Energy
Grain boundaries
Hafnium oxide
Illumination
Inorganic Chemistry
Instability
Light emitting diodes
Materials Engineering
Materials research
Materials Science
Nanotechnology
Photovoltaic cells
Radiation
Review
Semiconductor devices
Semiconductors
Silicon
Stability
Studies
Thin films
Transistors
Zinc oxides
title Illumination instabilities in ZnO/HfO2 thin-film transistors and influence of grain boundary charge
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