Modified Roberts-Langenbeck test for measuring thickness and refractive index variation of silicon wafers

We describe a method to simultaneously measure thickness variation and refractive index homogeneity of 300 mm diameter silicon wafers using a wavelength-shifting Fizeau interferometer operating at 1550 nm. Only three measurements are required, corresponding to three different cavity configurations....

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Veröffentlicht in:	Optics express 2012-08, Vol.20 (18), p.20078-20089
Hauptverfasser:	Park, Jungjae, Chen, Lingfeng, Wang, Quandou, Griesmann, Ulf
Format:	Artikel
Sprache:	eng
Schlagworte:	Algorithms Materials Testing - methods Refractometry - methods Silicon - chemistry
Online-Zugang:	Volltext
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