Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications

This paper presents a novel technological and design study of optical guided-wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top–down) by a crossing optical waveguide wafer. The mirrors are designed to be pulled up and in...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Sensors and actuators. A. Physical. 2005-09, Vol.123, p.570-583
Hauptverfasser: Guerre, R., Hibert, C., Burri, Y., Flückiger, Ph, Renaud, Ph
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 583
container_issue
container_start_page 570
container_title Sensors and actuators. A. Physical.
container_volume 123
creator Guerre, R.
Hibert, C.
Burri, Y.
Flückiger, Ph
Renaud, Ph
description This paper presents a novel technological and design study of optical guided-wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top–down) by a crossing optical waveguide wafer. The mirrors are designed to be pulled up and inserted at waveguide intersection for N × N optical switching. Vertical micromirrors have been fabricated in SU8 photopolymer or in single crystalline silicon (on SOI substrate). The SU8 mirrors, coated with gold layer, exhibit vertical and smooth sidewalls that will be sufficient for optical use. For integration of silicon mirrors, we have developed a new simple two-step deep reactive ion etching (DRIE) pattern transfer that allow simultaneous fabrication of good quality silicon mirrors (20 μm height and 2 μm thickness) and of recessed mechanical platform (5 μm thick). The platform has been analysed through its resonance behaviour. The strong effect of mechanical non-linearity which is observed in clamped suspension can be exploited to increase the control range of the electrostatic actuator.
doi_str_mv 10.1016/j.sna.2005.02.039
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1082178415</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0924424705001299</els_id><sourcerecordid>1082178415</sourcerecordid><originalsourceid>FETCH-LOGICAL-c330t-22272985f587df47195733306cd9370022269231aca167983f40cb883432841f3</originalsourceid><addsrcrecordid>eNp9kD1PwzAQhi0EEqXwA9gysiSc7SSOxYQqCkiVWGC2XMcpVyVxsJNWrPxyXLViZDr5_fDpHkJuKWQUaHm_zUKvMwZQZMAy4PKMzGgleMqhlOdkBpLlac5ycUmuQtgCAOdCzMjPUq89Gj2i6xPXJDvrx_hskxo3OMYZsEVz8Iaj3qHxrkPvnQ9J1MMUBtvXtk5sa83oXW2TxvlkM2EU073e2b9u2ONoPrHfJHoY2tPWcE0uGt0Ge3Oac_KxfHpfvKSrt-fXxeMqNZzDmDLGBJNV0RSVqJtcUFkIHp3S1JILgOiXknGqjaalkBVvcjDrquI5Z1VOGz4nd8d_B---JhtG1WEwtm11b90UFIWKURGjRYzSYzTeGoK3jRo8dtp_x5A68FZbFXmrA28FTEXesfNw7Nh4ww6tV8Gg7Y2t0Ucwqnb4T_sXLw6J4w</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>1082178415</pqid></control><display><type>article</type><title>Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications</title><source>Access via ScienceDirect (Elsevier)</source><creator>Guerre, R. ; Hibert, C. ; Burri, Y. ; Flückiger, Ph ; Renaud, Ph</creator><creatorcontrib>Guerre, R. ; Hibert, C. ; Burri, Y. ; Flückiger, Ph ; Renaud, Ph</creatorcontrib><description>This paper presents a novel technological and design study of optical guided-wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top–down) by a crossing optical waveguide wafer. The mirrors are designed to be pulled up and inserted at waveguide intersection for N × N optical switching. Vertical micromirrors have been fabricated in SU8 photopolymer or in single crystalline silicon (on SOI substrate). The SU8 mirrors, coated with gold layer, exhibit vertical and smooth sidewalls that will be sufficient for optical use. For integration of silicon mirrors, we have developed a new simple two-step deep reactive ion etching (DRIE) pattern transfer that allow simultaneous fabrication of good quality silicon mirrors (20 μm height and 2 μm thickness) and of recessed mechanical platform (5 μm thick). The platform has been analysed through its resonance behaviour. The strong effect of mechanical non-linearity which is observed in clamped suspension can be exploited to increase the control range of the electrostatic actuator.</description><identifier>ISSN: 0924-4247</identifier><identifier>EISSN: 1873-3069</identifier><identifier>DOI: 10.1016/j.sna.2005.02.039</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Actuators ; DRIE ; Electrodes ; Microelectromechanical systems ; Micromirrors ; Optical MEMS ; Optical switches ; Optical switching ; Platforms ; Silicon ; Silicon substrates ; Wafers</subject><ispartof>Sensors and actuators. A. Physical., 2005-09, Vol.123, p.570-583</ispartof><rights>2005 Elsevier B.V.</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c330t-22272985f587df47195733306cd9370022269231aca167983f40cb883432841f3</citedby><cites>FETCH-LOGICAL-c330t-22272985f587df47195733306cd9370022269231aca167983f40cb883432841f3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.sna.2005.02.039$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>315,781,785,3551,27929,27930,46000</link.rule.ids></links><search><creatorcontrib>Guerre, R.</creatorcontrib><creatorcontrib>Hibert, C.</creatorcontrib><creatorcontrib>Burri, Y.</creatorcontrib><creatorcontrib>Flückiger, Ph</creatorcontrib><creatorcontrib>Renaud, Ph</creatorcontrib><title>Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications</title><title>Sensors and actuators. A. Physical.</title><description>This paper presents a novel technological and design study of optical guided-wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top–down) by a crossing optical waveguide wafer. The mirrors are designed to be pulled up and inserted at waveguide intersection for N × N optical switching. Vertical micromirrors have been fabricated in SU8 photopolymer or in single crystalline silicon (on SOI substrate). The SU8 mirrors, coated with gold layer, exhibit vertical and smooth sidewalls that will be sufficient for optical use. For integration of silicon mirrors, we have developed a new simple two-step deep reactive ion etching (DRIE) pattern transfer that allow simultaneous fabrication of good quality silicon mirrors (20 μm height and 2 μm thickness) and of recessed mechanical platform (5 μm thick). The platform has been analysed through its resonance behaviour. The strong effect of mechanical non-linearity which is observed in clamped suspension can be exploited to increase the control range of the electrostatic actuator.</description><subject>Actuators</subject><subject>DRIE</subject><subject>Electrodes</subject><subject>Microelectromechanical systems</subject><subject>Micromirrors</subject><subject>Optical MEMS</subject><subject>Optical switches</subject><subject>Optical switching</subject><subject>Platforms</subject><subject>Silicon</subject><subject>Silicon substrates</subject><subject>Wafers</subject><issn>0924-4247</issn><issn>1873-3069</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp9kD1PwzAQhi0EEqXwA9gysiSc7SSOxYQqCkiVWGC2XMcpVyVxsJNWrPxyXLViZDr5_fDpHkJuKWQUaHm_zUKvMwZQZMAy4PKMzGgleMqhlOdkBpLlac5ycUmuQtgCAOdCzMjPUq89Gj2i6xPXJDvrx_hskxo3OMYZsEVz8Iaj3qHxrkPvnQ9J1MMUBtvXtk5sa83oXW2TxvlkM2EU073e2b9u2ONoPrHfJHoY2tPWcE0uGt0Ge3Oac_KxfHpfvKSrt-fXxeMqNZzDmDLGBJNV0RSVqJtcUFkIHp3S1JILgOiXknGqjaalkBVvcjDrquI5Z1VOGz4nd8d_B---JhtG1WEwtm11b90UFIWKURGjRYzSYzTeGoK3jRo8dtp_x5A68FZbFXmrA28FTEXesfNw7Nh4ww6tV8Gg7Y2t0Ucwqnb4T_sXLw6J4w</recordid><startdate>20050923</startdate><enddate>20050923</enddate><creator>Guerre, R.</creator><creator>Hibert, C.</creator><creator>Burri, Y.</creator><creator>Flückiger, Ph</creator><creator>Renaud, Ph</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7TB</scope><scope>7U5</scope><scope>8FD</scope><scope>FR3</scope><scope>L7M</scope></search><sort><creationdate>20050923</creationdate><title>Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications</title><author>Guerre, R. ; Hibert, C. ; Burri, Y. ; Flückiger, Ph ; Renaud, Ph</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c330t-22272985f587df47195733306cd9370022269231aca167983f40cb883432841f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Actuators</topic><topic>DRIE</topic><topic>Electrodes</topic><topic>Microelectromechanical systems</topic><topic>Micromirrors</topic><topic>Optical MEMS</topic><topic>Optical switches</topic><topic>Optical switching</topic><topic>Platforms</topic><topic>Silicon</topic><topic>Silicon substrates</topic><topic>Wafers</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Guerre, R.</creatorcontrib><creatorcontrib>Hibert, C.</creatorcontrib><creatorcontrib>Burri, Y.</creatorcontrib><creatorcontrib>Flückiger, Ph</creatorcontrib><creatorcontrib>Renaud, Ph</creatorcontrib><collection>CrossRef</collection><collection>Mechanical &amp; Transportation Engineering Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Sensors and actuators. A. Physical.</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Guerre, R.</au><au>Hibert, C.</au><au>Burri, Y.</au><au>Flückiger, Ph</au><au>Renaud, Ph</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications</atitle><jtitle>Sensors and actuators. A. Physical.</jtitle><date>2005-09-23</date><risdate>2005</risdate><volume>123</volume><spage>570</spage><epage>583</epage><pages>570-583</pages><issn>0924-4247</issn><eissn>1873-3069</eissn><abstract>This paper presents a novel technological and design study of optical guided-wave MicroElectroMechanical Systems (MEMS) switch. We work on a concept of hermetic assembly in which a MEMS wafer is covered (top–down) by a crossing optical waveguide wafer. The mirrors are designed to be pulled up and inserted at waveguide intersection for N × N optical switching. Vertical micromirrors have been fabricated in SU8 photopolymer or in single crystalline silicon (on SOI substrate). The SU8 mirrors, coated with gold layer, exhibit vertical and smooth sidewalls that will be sufficient for optical use. For integration of silicon mirrors, we have developed a new simple two-step deep reactive ion etching (DRIE) pattern transfer that allow simultaneous fabrication of good quality silicon mirrors (20 μm height and 2 μm thickness) and of recessed mechanical platform (5 μm thick). The platform has been analysed through its resonance behaviour. The strong effect of mechanical non-linearity which is observed in clamped suspension can be exploited to increase the control range of the electrostatic actuator.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.sna.2005.02.039</doi><tpages>14</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0924-4247
ispartof Sensors and actuators. A. Physical., 2005-09, Vol.123, p.570-583
issn 0924-4247
1873-3069
language eng
recordid cdi_proquest_miscellaneous_1082178415
source Access via ScienceDirect (Elsevier)
subjects Actuators
DRIE
Electrodes
Microelectromechanical systems
Micromirrors
Optical MEMS
Optical switches
Optical switching
Platforms
Silicon
Silicon substrates
Wafers
title Fabrication of vertical digital silicon optical micromirrors on suspended electrode for guided-wave optical switching applications
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-13T13%3A11%3A38IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Fabrication%20of%20vertical%20digital%20silicon%20optical%20micromirrors%20on%20suspended%20electrode%20for%20guided-wave%20optical%20switching%20applications&rft.jtitle=Sensors%20and%20actuators.%20A.%20Physical.&rft.au=Guerre,%20R.&rft.date=2005-09-23&rft.volume=123&rft.spage=570&rft.epage=583&rft.pages=570-583&rft.issn=0924-4247&rft.eissn=1873-3069&rft_id=info:doi/10.1016/j.sna.2005.02.039&rft_dat=%3Cproquest_cross%3E1082178415%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=1082178415&rft_id=info:pmid/&rft_els_id=S0924424705001299&rfr_iscdi=true