Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities

Ultrahigh‐Q optical whispering gallery microcavities are promising platforms for fundamental studies and applied photonics. A new type of on‐chip microcavity is experimentally realized, which supports both highly unidirectional emission and ultra‐high‐Q factors exceeding 100 million in near infrared...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Weinheim) 2012-09, Vol.24 (35), p.OP260-OP264
Hauptverfasser: Jiang, Xue-Feng, Xiao, Yun-Feng, Zou, Chang-Ling, He, Lina, Dong, Chun-Hua, Li, Bei-Bei, Li, Yan, Sun, Fang-Wen, Yang, Lan, Gong, Qihuang
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page OP264
container_issue 35
container_start_page OP260
container_title Advanced materials (Weinheim)
container_volume 24
creator Jiang, Xue-Feng
Xiao, Yun-Feng
Zou, Chang-Ling
He, Lina
Dong, Chun-Hua
Li, Bei-Bei
Li, Yan
Sun, Fang-Wen
Yang, Lan
Gong, Qihuang
description Ultrahigh‐Q optical whispering gallery microcavities are promising platforms for fundamental studies and applied photonics. A new type of on‐chip microcavity is experimentally realized, which supports both highly unidirectional emission and ultra‐high‐Q factors exceeding 100 million in near infrared. By doping erbium, the unidirectional‐emission lasing is observed in 1550 nm band with the threshold as low as 2 μW.
doi_str_mv 10.1002/adma.201201229
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_1038066575</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2817201870</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4519-26107ee9dc1d27c45a4dd0c3d95222f739f34ac50fef16513251424c9c85e2a73</originalsourceid><addsrcrecordid>eNqFkM9r2zAAhcXYWNNu1x6LYZddlOmHZVnHLMua0rSlkNCj0CS5VifbqeSszX9fBaeh9DIQSIjvffAeAKcYjTFC5IcyjRoThHeHiA9ghBnBMEeCfQQjJCiDosjLI3Ac4wNCSBSo-AyOCClLjhgbAT1397XfZqvWGRes7l3XKp_NGhdjemaqNdnK90H57gku62Bj3XmTLVR07X1Wha7Jblo4rd16wOqkg7fZldOh0-qf652NX8CnSvlov-7vE7D6PVtO53Bxc34xnSygzhkWkBQYcWuF0dgQnv5UbgzS1AhGCKk4FRXNlWaoshUuGKaE4ZzkWuiSWaI4PQHfB-86dI8bG3uZWmjrvWptt4kSI1qiomCcJfTbO_Sh24TUPEpSYp7WTPskajxQqUyMwVZyHVyjwjap5G5-uZtfHuZPgbO9dvOnseaAv-6dADEAT87b7X90cvLravJWDoesi719PmRV-CsLTjmTd9fncpkTKq5_XsoFfQEOxJ9h</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2817201870</pqid></control><display><type>article</type><title>Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities</title><source>MEDLINE</source><source>Wiley Online Library Journals Frontfile Complete</source><creator>Jiang, Xue-Feng ; Xiao, Yun-Feng ; Zou, Chang-Ling ; He, Lina ; Dong, Chun-Hua ; Li, Bei-Bei ; Li, Yan ; Sun, Fang-Wen ; Yang, Lan ; Gong, Qihuang</creator><creatorcontrib>Jiang, Xue-Feng ; Xiao, Yun-Feng ; Zou, Chang-Ling ; He, Lina ; Dong, Chun-Hua ; Li, Bei-Bei ; Li, Yan ; Sun, Fang-Wen ; Yang, Lan ; Gong, Qihuang</creatorcontrib><description>Ultrahigh‐Q optical whispering gallery microcavities are promising platforms for fundamental studies and applied photonics. A new type of on‐chip microcavity is experimentally realized, which supports both highly unidirectional emission and ultra‐high‐Q factors exceeding 100 million in near infrared. By doping erbium, the unidirectional‐emission lasing is observed in 1550 nm band with the threshold as low as 2 μW.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.201201229</identifier><identifier>PMID: 22887055</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Emission ; Erbium ; Lasers ; Lasing ; Materials science ; Microcavities ; microcavity ; Microtechnology - methods ; Optical Phenomena ; Silicon - chemistry ; Silicon Dioxide - chemistry ; ultrahigh quality factor ; ultralow threshold ; unidirectional emission ; whispering gallery mode</subject><ispartof>Advanced materials (Weinheim), 2012-09, Vol.24 (35), p.OP260-OP264</ispartof><rights>Copyright © 2012 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><rights>Copyright Wiley Subscription Services, Inc. Sep 2012</rights><lds50>peer_reviewed</lds50><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4519-26107ee9dc1d27c45a4dd0c3d95222f739f34ac50fef16513251424c9c85e2a73</citedby><cites>FETCH-LOGICAL-c4519-26107ee9dc1d27c45a4dd0c3d95222f739f34ac50fef16513251424c9c85e2a73</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fadma.201201229$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fadma.201201229$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,776,780,1411,27901,27902,45550,45551</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/22887055$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Jiang, Xue-Feng</creatorcontrib><creatorcontrib>Xiao, Yun-Feng</creatorcontrib><creatorcontrib>Zou, Chang-Ling</creatorcontrib><creatorcontrib>He, Lina</creatorcontrib><creatorcontrib>Dong, Chun-Hua</creatorcontrib><creatorcontrib>Li, Bei-Bei</creatorcontrib><creatorcontrib>Li, Yan</creatorcontrib><creatorcontrib>Sun, Fang-Wen</creatorcontrib><creatorcontrib>Yang, Lan</creatorcontrib><creatorcontrib>Gong, Qihuang</creatorcontrib><title>Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities</title><title>Advanced materials (Weinheim)</title><addtitle>Adv. Mater</addtitle><description>Ultrahigh‐Q optical whispering gallery microcavities are promising platforms for fundamental studies and applied photonics. A new type of on‐chip microcavity is experimentally realized, which supports both highly unidirectional emission and ultra‐high‐Q factors exceeding 100 million in near infrared. By doping erbium, the unidirectional‐emission lasing is observed in 1550 nm band with the threshold as low as 2 μW.</description><subject>Emission</subject><subject>Erbium</subject><subject>Lasers</subject><subject>Lasing</subject><subject>Materials science</subject><subject>Microcavities</subject><subject>microcavity</subject><subject>Microtechnology - methods</subject><subject>Optical Phenomena</subject><subject>Silicon - chemistry</subject><subject>Silicon Dioxide - chemistry</subject><subject>ultrahigh quality factor</subject><subject>ultralow threshold</subject><subject>unidirectional emission</subject><subject>whispering gallery mode</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2012</creationdate><recordtype>article</recordtype><sourceid>EIF</sourceid><recordid>eNqFkM9r2zAAhcXYWNNu1x6LYZddlOmHZVnHLMua0rSlkNCj0CS5VifbqeSszX9fBaeh9DIQSIjvffAeAKcYjTFC5IcyjRoThHeHiA9ghBnBMEeCfQQjJCiDosjLI3Ac4wNCSBSo-AyOCClLjhgbAT1397XfZqvWGRes7l3XKp_NGhdjemaqNdnK90H57gku62Bj3XmTLVR07X1Wha7Jblo4rd16wOqkg7fZldOh0-qf652NX8CnSvlov-7vE7D6PVtO53Bxc34xnSygzhkWkBQYcWuF0dgQnv5UbgzS1AhGCKk4FRXNlWaoshUuGKaE4ZzkWuiSWaI4PQHfB-86dI8bG3uZWmjrvWptt4kSI1qiomCcJfTbO_Sh24TUPEpSYp7WTPskajxQqUyMwVZyHVyjwjap5G5-uZtfHuZPgbO9dvOnseaAv-6dADEAT87b7X90cvLravJWDoesi719PmRV-CsLTjmTd9fncpkTKq5_XsoFfQEOxJ9h</recordid><startdate>20120911</startdate><enddate>20120911</enddate><creator>Jiang, Xue-Feng</creator><creator>Xiao, Yun-Feng</creator><creator>Zou, Chang-Ling</creator><creator>He, Lina</creator><creator>Dong, Chun-Hua</creator><creator>Li, Bei-Bei</creator><creator>Li, Yan</creator><creator>Sun, Fang-Wen</creator><creator>Yang, Lan</creator><creator>Gong, Qihuang</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley Subscription Services, Inc</general><scope>BSCLL</scope><scope>CGR</scope><scope>CUY</scope><scope>CVF</scope><scope>ECM</scope><scope>EIF</scope><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>7X8</scope></search><sort><creationdate>20120911</creationdate><title>Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities</title><author>Jiang, Xue-Feng ; Xiao, Yun-Feng ; Zou, Chang-Ling ; He, Lina ; Dong, Chun-Hua ; Li, Bei-Bei ; Li, Yan ; Sun, Fang-Wen ; Yang, Lan ; Gong, Qihuang</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4519-26107ee9dc1d27c45a4dd0c3d95222f739f34ac50fef16513251424c9c85e2a73</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2012</creationdate><topic>Emission</topic><topic>Erbium</topic><topic>Lasers</topic><topic>Lasing</topic><topic>Materials science</topic><topic>Microcavities</topic><topic>microcavity</topic><topic>Microtechnology - methods</topic><topic>Optical Phenomena</topic><topic>Silicon - chemistry</topic><topic>Silicon Dioxide - chemistry</topic><topic>ultrahigh quality factor</topic><topic>ultralow threshold</topic><topic>unidirectional emission</topic><topic>whispering gallery mode</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Jiang, Xue-Feng</creatorcontrib><creatorcontrib>Xiao, Yun-Feng</creatorcontrib><creatorcontrib>Zou, Chang-Ling</creatorcontrib><creatorcontrib>He, Lina</creatorcontrib><creatorcontrib>Dong, Chun-Hua</creatorcontrib><creatorcontrib>Li, Bei-Bei</creatorcontrib><creatorcontrib>Li, Yan</creatorcontrib><creatorcontrib>Sun, Fang-Wen</creatorcontrib><creatorcontrib>Yang, Lan</creatorcontrib><creatorcontrib>Gong, Qihuang</creatorcontrib><collection>Istex</collection><collection>Medline</collection><collection>MEDLINE</collection><collection>MEDLINE (Ovid)</collection><collection>MEDLINE</collection><collection>MEDLINE</collection><collection>PubMed</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>MEDLINE - Academic</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Jiang, Xue-Feng</au><au>Xiao, Yun-Feng</au><au>Zou, Chang-Ling</au><au>He, Lina</au><au>Dong, Chun-Hua</au><au>Li, Bei-Bei</au><au>Li, Yan</au><au>Sun, Fang-Wen</au><au>Yang, Lan</au><au>Gong, Qihuang</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities</atitle><jtitle>Advanced materials (Weinheim)</jtitle><addtitle>Adv. Mater</addtitle><date>2012-09-11</date><risdate>2012</risdate><volume>24</volume><issue>35</issue><spage>OP260</spage><epage>OP264</epage><pages>OP260-OP264</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>Ultrahigh‐Q optical whispering gallery microcavities are promising platforms for fundamental studies and applied photonics. A new type of on‐chip microcavity is experimentally realized, which supports both highly unidirectional emission and ultra‐high‐Q factors exceeding 100 million in near infrared. By doping erbium, the unidirectional‐emission lasing is observed in 1550 nm band with the threshold as low as 2 μW.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><pmid>22887055</pmid><doi>10.1002/adma.201201229</doi><tpages>5</tpages><oa>free_for_read</oa></addata></record>
fulltext fulltext
identifier ISSN: 0935-9648
ispartof Advanced materials (Weinheim), 2012-09, Vol.24 (35), p.OP260-OP264
issn 0935-9648
1521-4095
language eng
recordid cdi_proquest_miscellaneous_1038066575
source MEDLINE; Wiley Online Library Journals Frontfile Complete
subjects Emission
Erbium
Lasers
Lasing
Materials science
Microcavities
microcavity
Microtechnology - methods
Optical Phenomena
Silicon - chemistry
Silicon Dioxide - chemistry
ultrahigh quality factor
ultralow threshold
unidirectional emission
whispering gallery mode
title Highly Unidirectional Emission and Ultralow-Threshold Lasing from On-Chip Ultrahigh-Q Microcavities
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-14T00%3A44%3A10IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Highly%20Unidirectional%20Emission%20and%20Ultralow-Threshold%20Lasing%20from%20On-Chip%20Ultrahigh-Q%20Microcavities&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=Jiang,%20Xue-Feng&rft.date=2012-09-11&rft.volume=24&rft.issue=35&rft.spage=OP260&rft.epage=OP264&rft.pages=OP260-OP264&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/10.1002/adma.201201229&rft_dat=%3Cproquest_cross%3E2817201870%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2817201870&rft_id=info:pmid/22887055&rfr_iscdi=true